| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
An electromechanical device for measuring the deposition rates of thin films
|
Weissman, J
|
|
1969
|
19 |
12 |
p. 579-581
3 p.
|
artikel
|
| 2 |
Author index of abstracts
|
|
|
1969
|
19 |
12 |
p. 599-619
21 p.
|
artikel
|
| 3 |
A variable temperature cryostat with external coolant source for the preparation and measurement of thin film in vacuum
|
Ahilea, E
|
|
1969
|
19 |
12 |
p. 541-543
3 p.
|
artikel
|
| 4 |
Biographies of authors
|
|
|
1969
|
19 |
12 |
p. 582-584
3 p.
|
artikel
|
| 5 |
Classified abstracts
|
|
|
1969
|
19 |
12 |
p. 597-
1 p.
|
artikel
|
| 6 |
Classified abstracts 1201–1393
|
|
|
1969
|
19 |
12 |
p. 597-598
2 p.
|
artikel
|
| 7 |
Commercial news
|
|
|
1969
|
19 |
12 |
p. 594-596
3 p.
|
artikel
|
| 8 |
Epitaxial growth of nickel films
|
Kleefeld, J
|
|
1969
|
19 |
12 |
p. 561-563
3 p.
|
artikel
|
| 9 |
Erratum
|
|
|
1969
|
19 |
12 |
p. 620-621
2 p.
|
artikel
|
| 10 |
Exhibition of Vacuum Equipment at the First Israeli Vacuum Congress
|
|
|
1969
|
19 |
12 |
p. 585-589
5 p.
|
artikel
|
| 11 |
International Union for Vacuum Science, Technique and Applications
|
|
|
1969
|
19 |
12 |
p. 590-592
3 p.
|
artikel
|
| 12 |
New literature
|
|
|
1969
|
19 |
12 |
p. 596-
1 p.
|
artikel
|
| 13 |
Personal
|
|
|
1969
|
19 |
12 |
p. 596-
1 p.
|
artikel
|
| 14 |
Physical and technical aspects of ultra-high vacuum technology (Extended abstract)
|
Adam, H
|
|
1969
|
19 |
12 |
p. 544-
1 p.
|
artikel
|
| 15 |
Some problems associated with the attainment of ultra high vacuum
|
Fulker, M.J.
|
|
1969
|
19 |
12 |
p. 555-560
6 p.
|
artikel
|
| 16 |
Some vacuum aspects of vacuum ultraviolet spectroscopy
|
Raz, B
|
|
1969
|
19 |
12 |
p. 571-574
4 p.
|
artikel
|
| 17 |
Technical and industrial developments
|
|
|
1969
|
19 |
12 |
p. 593-594
2 p.
|
artikel
|
| 18 |
The influence of preparation conditions on the optical properties of thin films
|
Rabinovitch, K
|
|
1969
|
19 |
12 |
p. 564-566
3 p.
|
artikel
|
| 19 |
The Israeli Society for Vacuum Technology and its first congress
|
Roth, A
|
|
1969
|
19 |
12 |
p. 539-540
2 p.
|
artikel
|
| 20 |
The Israeli Society for Vacuum Technology and the First Israeli Vacuum Congress, Tel-Aviv, 19–20 May 1969
|
Thomas, E
|
|
1969
|
19 |
12 |
p. 537-538
2 p.
|
artikel
|
| 21 |
The microelectronics laboratory at the Technion
|
Bar-Lev, A
|
|
1969
|
19 |
12 |
p. 545-546
2 p.
|
artikel
|
| 22 |
The role of Auger electron spectroscopy in surface elemental analysis
|
Taylor, N.J.
|
|
1969
|
19 |
12 |
p. 575-578
4 p.
|
artikel
|
| 23 |
The use of the partial pressure gauge for the analysis of residual gases in high-vacuum systems
|
Estermann, I
|
|
1969
|
19 |
12 |
p. 553-554
2 p.
|
artikel
|
| 24 |
The vacuum system of “SOLIS” (Soreq on-line isotope separator)
|
Oron, M
|
|
1969
|
19 |
12 |
p. 567-570
4 p.
|
artikel
|
| 25 |
Vacuum technology aspects in the design of electromagnetic isotope separators
|
Chavet, I
|
|
1969
|
19 |
12 |
p. 547-552
6 p.
|
artikel
|
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