nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A bakeable all-metal valve
|
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|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
2 |
A cold high vacuum seal without gaskets
|
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|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
3 |
A diffusion pump with a new nozzle
|
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|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
4 |
Adjustable tubing and hose clamps
|
Central Scientific Co., |
|
1964 |
14 |
4 |
p. 151- 1 p. |
artikel |
5 |
Adsorption and desorption phenomena and their role in particle accelerators and space simulators
|
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1964 |
14 |
4 |
p. 160- 1 p. |
artikel |
6 |
Adsorption and desorption phenomena and their role in particle accelerators and space simulators
|
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
7 |
Adsorption and desorption phenomena and their role in particle accelerators and space simulators
|
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1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
8 |
A mass spectrometer for studying chemical reactions
|
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
9 |
A mass spectrometer for studying chemical reactions
|
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1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
10 |
A measurement of the ionization cross-section of Ne to Ne by electron impact
|
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
11 |
A method for the continuous measurement of thickness and deposition rate of conducting films during a vacuum evaporation
|
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
12 |
A method for the continuous measurement of thickness and deposition rate of conducting films during vacuum evaporation
|
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
13 |
An attempt to develop a theory for the formation of thin films
|
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
14 |
An attempt to develop a theory for the formation of thin films
|
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1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
15 |
An automatic experimental vacuum deposition system
|
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
16 |
Anomalous residual currents with ultra-high vacuum use of Bayard-Alpert ionization gauges
|
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
17 |
A selection guide to fluorcarbon plastics
|
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1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
18 |
A theoretical and experimental relationship between leakage of gases through the interface of two metals in contact and their superficial microgeometry
|
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
19 |
A theoretical and experimental relationship between the leakage of gases through the interface of two metals in contact and their superficial micro-geometry
|
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1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
20 |
Author index of abstracts
|
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1964 |
14 |
4 |
p. 170- 1 p. |
artikel |
21 |
A vacuum gauge of very simple design utilising a radioactive source of tritium and covering the pressure range of 10−4 to 200 torr
|
Blanc, Daniel |
|
1964 |
14 |
4 |
p. 145-148 4 p. |
artikel |
22 |
Balzers instal new coating plant with optical firm
|
Balzers High Vacuum Ltd., |
|
1964 |
14 |
4 |
p. 153- 1 p. |
artikel |
23 |
Coating thickness measurement by electron probe microanalysis
|
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
24 |
Coating thickness measurement by electron prote microanalysis
|
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
25 |
Cold traps, the condensing surface of which does not decrease with time of operation (temperature remaining constant)
|
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
26 |
Comparative measurements between the Bayard-Alpert gauge and Lafferty's magnetron gauge
|
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
27 |
Comparative measurements between the Bayard-Alpert gauge and Lafferty's magnetron gauge
|
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
28 |
Condensation of gas mixtures on low temperature surfaces
|
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
29 |
Condensation of gas-mixtures on low-temperature surfaces
|
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1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
30 |
Conduction cooled, concentric sphere, glass trap
|
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
31 |
Contribution to the study of surfaces by physical adsorption
|
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1964 |
14 |
4 |
p. 160- 1 p. |
artikel |
32 |
Contribution to the study of surfaces by physical adsorption
|
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1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
33 |
Contribution to the study of surfaces by physical adsorption
|
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
34 |
Contributors to this issue
|
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1964 |
14 |
4 |
p. 154- 1 p. |
artikel |
35 |
Criterion of surface roughness applied to reflection by fluoride interference films on uranium dioxide—refractive index of uranium dioxide
|
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|
1964 |
14 |
4 |
p. 162- 1 p. |
artikel |
36 |
Cryogenic pump tests with hydrogen under ultra-high vacuum conditions with range 4.2°K and 2.5°K
|
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
37 |
Cryogenic pump tests with hydrogen under ultra-high vacuum conditions with range 4.2K and 2.5K
|
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|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
38 |
Cylindrical oven for accelerated drying work
|
Central Scientific Co., |
|
1964 |
14 |
4 |
p. 152- 1 p. |
artikel |
39 |
Degassing characteristics of some “O” ring materials
|
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|
1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
40 |
Degassing characteristics of some “ O ” ring materials
|
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
41 |
Degassing characteristics of some “O” ring materials
|
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1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
42 |
Desorption experiments in an ultra-high vacuum system, pumped by molecular sieve trapped oil diffusion pumps
|
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1964 |
14 |
4 |
p. 157- 1 p. |
artikel |
43 |
Desorption experiments in an ultra-high vacuum system, pumped by molecular sieve trapped oil diffusion pumps
|
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
44 |
Desorption experiments in an ultra-high vacuum system, pumped by molecular sieve trapped oil diffusion pumps
|
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
45 |
Desorption of gases in getter-ion pumps
|
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
46 |
Desorption of gases in getter-ion pumps
|
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1964 |
14 |
4 |
p. 160- 1 p. |
artikel |
47 |
Detection of single slow ions: a method of pressure measurement
|
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
48 |
Detection of single slow ions: a method of pressure measurement
|
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|
1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
49 |
Determination of the optical constants of weakly absorbing thin films
|
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|
1964 |
14 |
4 |
p. 162- 1 p. |
artikel |
50 |
Determination of the refractive index of thin dielectric films
|
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1964 |
14 |
4 |
p. 162- 1 p. |
artikel |
51 |
Difference between nude and enclosed ion gauges on an oil-free system
|
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
52 |
Difference between nude and enclosed ion gauges on an oil-free system
|
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
53 |
Differential manometer of high sensitivity
|
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|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
54 |
Editorial
|
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|
1964 |
14 |
4 |
p. 155- 1 p. |
artikel |
55 |
Editorial
|
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|
1964 |
14 |
4 |
p. 156- 1 p. |
artikel |
56 |
Effect of light molecules on vibrational relaxation in oxygen
|
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|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
57 |
Electron impact studies of some sulphides and disulphides
|
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|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
58 |
Electron microscope measurements on evaporated, barium titanate films
|
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|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
59 |
Electron microscope measurements on evaporated barium titanate films
|
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|
1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
60 |
Electron microscope measurements on evaporated barium titanate films
|
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|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
61 |
Erratum
|
|
|
1964 |
14 |
4 |
p. 171- 1 p. |
artikel |
62 |
First commercial instrument for low energy electron diffraction studies
|
Varian Associates, |
|
1964 |
14 |
4 |
p. 151- 1 p. |
artikel |
63 |
Flow characteristics of cryogenic fluids in vacuum
|
|
|
1964 |
14 |
4 |
p. 165- 1 p. |
artikel |
64 |
Flow characteristics of cryogenic fluids in vacuum
|
|
|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
65 |
Gas desorption from the ionization gauge and the pressure in high-vacuum systems of small volume
|
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|
1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
66 |
Gas desorption from the ionization gauge and the pressure in high-vacuum systems of small volume
|
|
|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
67 |
Handbook of high vacuum engineering
|
Burrows, G. |
|
1964 |
14 |
4 |
p. 150- 1 p. |
artikel |
68 |
Heat leaks through rarefied gases
|
|
|
1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
69 |
Heraeus produce the Volksofen, a small electron beam melting furnace
|
Heraeus G.m.b.H., |
|
1964 |
14 |
4 |
p. 152- 1 p. |
artikel |
70 |
Higher pressures (∼ 1 torr) mass spectrometer
|
|
|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
71 |
High temperature vacuum furnace with metallic sheet resistance elements
|
|
|
1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
72 |
High vacuum dual-motion feedthrough
|
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|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
73 |
High vacuum motor
|
|
|
1964 |
14 |
4 |
p. 169- 1 p. |
artikel |
74 |
Improved recording vacuum balance
|
|
|
1964 |
14 |
4 |
p. 165- 1 p. |
artikel |
75 |
Improved recording vacuum balance
|
|
|
1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
76 |
Inclusion of the rate of manifold outgassing in the vacuum pumping equation
|
|
|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
77 |
Inclusion of the rate of manifold outgassing in the vacuum pumping equation
|
|
|
1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
78 |
Index to advertisers
|
|
|
1964 |
14 |
4 |
p. ii- 1 p. |
artikel |
79 |
Induction furnace designed for 20,000 lb. ingot capacity
|
Ajax Magnethermic Corp., |
|
1964 |
14 |
4 |
p. 152- 1 p. |
artikel |
80 |
Infrared heater for substrates of vacuum deposited films
|
|
|
1964 |
14 |
4 |
p. 162- 1 p. |
artikel |
81 |
Infrared heater for substrates of vacuum deposited films
|
|
|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
82 |
Ion etching—an efficacious method for the elimination of foreign layers in ultra vacuum
|
|
|
1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
83 |
Ion etching—an efficacious method for the elimination of foreign layers in ultra vacuum
|
|
|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
84 |
Ionization and dissociation in some fluorocarbon gases
|
|
|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
85 |
Ionization gauges as a thermal conductivity vacuum gauge
|
|
|
1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
86 |
Ionization gauges as a thermal conductivity vacuum gauge
|
|
|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
87 |
Ionization-type vacuum gauge with electron multiplier output
|
|
|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
88 |
Leakage detection in high and ultra-high vacuum systems
|
|
|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
89 |
Linear electro-optic effect in CdS
|
|
|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
90 |
Low pressure gas discharge switches
|
|
|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
91 |
Mass-production of thin film circuits studied by STC
|
Vacuum Industrial Applications Ltd., |
|
1964 |
14 |
4 |
p. 153- 1 p. |
artikel |
92 |
Mass spectrometer sampling through a small hole in the adiabatic flow region
|
|
|
1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
93 |
Mass spectrometer sampling through a small hole in the adiabatic flow region
|
|
|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
94 |
Mass-spectrometric measurement of diffusion coefficients
|
|
|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
95 |
Measurement by means of Widmannstatten pattern of the thickness of thin metallic films for examination in the electron microscope
|
|
|
1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
96 |
Measurement by means of Widmanstätten pattern of the thickness of a thin metallic film for examination in the electron microscope
|
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|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
97 |
Measurement of evaporated film thickness and concentration by electron probe X-ray microanalyser
|
|
|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
98 |
Measurement of evaporated film thickness and concentration by electron prote X-ray microanalyser
|
|
|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
99 |
Mechanical rate of deposition monitor
|
|
|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
100 |
Mechanical rate of deposition monitor
|
|
|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
101 |
Metastable state of the doubly charged carbon dioxide ion
|
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|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
102 |
Method of making multiple glass-tungsten rod seals
|
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|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
103 |
Modification of a vacuum metallizing unit
|
|
|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
104 |
Nitriding, sintering and brazing by glow discharge
|
|
|
1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
105 |
NRC pump is four times faster than predecessor
|
NRC Equipment Corp., |
|
1964 |
14 |
4 |
p. 151- 1 p. |
artikel |
106 |
Omegatron Studies I: Interaction of oxygen with tantalum and tungsten
|
Gasser, R.P.H. |
|
1964 |
14 |
4 |
p. 141-143 3 p. |
artikel |
107 |
On the determination of the relative phase change at reflection air-metal and its variation with thickness for silver layers
|
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|
1964 |
14 |
4 |
p. 162- 1 p. |
artikel |
108 |
On the relaxation of the hard sphere Rayleigh and Lorentz gas
|
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|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
109 |
Optical properties of anodic-oxide interference films on uranium immersed in refractive media
|
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|
1964 |
14 |
4 |
p. 162- 1 p. |
artikel |
110 |
Organization set-up and methods employed for testing the vacuum tightness of the gaseous isotope diffusion plant at Piere-lotte
|
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|
1964 |
14 |
4 |
p. 165- 1 p. |
artikel |
111 |
Organization set up and methods employed for testing the vacuum tightness of the gaseous isotope diffusion plant at Pierrelotte
|
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|
1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
112 |
Partial pressure analysis and partial pressure gauges
|
|
|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
113 |
Partial pressure analysis and partial pressure gauges
|
|
|
1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
114 |
Photoionization of atoms and recombination of ions in the vapors of alkali metals
|
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
115 |
Preliminary estimates for steam-jet air ejectors
|
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|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
116 |
Preparation and properties of vacuum deposited germanium films
|
|
|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
117 |
Preparation and properties of vacuum deposited germanium thin films
|
|
|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
118 |
Problems in establishing standards for vacuum measurement and in calibrating vacuum gauges
|
|
|
1964 |
14 |
4 |
p. 157- 1 p. |
artikel |
119 |
Problems in establishing standards for vacuum measurement and in calibrating vacuum gauges
|
|
|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
120 |
Problems in establishing standards for vacuum measurements and in calibrating vacuum gauges
|
|
|
1964 |
14 |
4 |
p. 169- 1 p. |
artikel |
121 |
Production of thin films of indium antimonide by vacuum evaporation
|
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|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
122 |
Production of thin films of indium antimonide by vacuum evaporation
|
|
|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
123 |
Quadrupole high frequency mass spectrometer for residual analysis in high vacuum systems
|
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|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
124 |
Quantitative investigation of cryotrapping effect of argon on hydrogen at 4.2 per cent
|
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|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
125 |
Regulation of ionization gauge emission current to better than 0.5 per cent
|
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|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
126 |
Review of vacuum techniques in metallurgy
|
Harper, M.E. |
|
1964 |
14 |
4 |
p. 149- 1 p. |
artikel |
127 |
Short length in-line cell metal vacuum valve
|
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|
1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
128 |
Single crystal films of semiconductor compounds by cathodic sputtering
|
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
129 |
Single crystal germanium films by microzone melting
|
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|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
130 |
Single crystal germanium films by microzone melting
|
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|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
131 |
Solved and unsolved adsorption problems
|
|
|
1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
132 |
Solved and unsolved adsorption problems
|
|
|
1964 |
14 |
4 |
p. 169- 1 p. |
artikel |
133 |
Solved and unsolved adsorption problems
|
|
|
1964 |
14 |
4 |
p. 160- 1 p. |
artikel |
134 |
Some applications of a torsion microbalance for investigations of surface phenomena and thin film properties in ultra-high vacuum
|
|
|
1964 |
14 |
4 |
p. 165- 1 p. |
artikel |
135 |
Some applications of a torsion microbalance for the investigation of surface phenomena and thin film properties in ultra-high vacuum
|
|
|
1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
136 |
Some applications of a torsion microbalance for the investigation of surface phenomena and thin film properties in ultra-high vacuum
|
|
|
1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
137 |
Space chamber on wheel is designed for nuclear testing
|
NRC Equipment Corp., |
|
1964 |
14 |
4 |
p. 151- 1 p. |
artikel |
138 |
Spectra excited in a helium after glow
|
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|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
139 |
Speed of sorption of nitrogen activated by electron impact
|
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1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
140 |
Speed of sorption of nitrogen activated by electron impact
|
|
|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
141 |
Studies on a mechanical booster vacuum pump
|
|
|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
142 |
Study of evaporated electroluminescent films of a ZnS-Cu, Mn Luminor
|
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|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
143 |
Surface treatments and material outgassing
|
|
|
1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
144 |
Surface treatments and material outgassing
|
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|
1964 |
14 |
4 |
p. 159-160 2 p. |
artikel |
145 |
Surface treatments and material outgassing
|
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|
1964 |
14 |
4 |
p. 169- 1 p. |
artikel |
146 |
The calculation of radiometer forces on measuring systems exhibiting rotary symmetry
|
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|
1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
147 |
The calculation of radiometer forces on measuring systems exhibiting rotary symmetry
|
|
|
1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
148 |
The calculation of radiometer forces on measuring systems exhibiting rotary symmetry
|
|
|
1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
149 |
The calculation of the pressure distribution in vacuum systems, taking into account adsorption and condensation
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1964 |
14 |
4 |
p. 157- 1 p. |
artikel |
150 |
The calculation of the pressure distribution in vacuum systems, taking into account adsorption and condensation
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1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
151 |
The calculation of the pressure distribution in vacuum systems, taking into account adsorption and condensation
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1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
152 |
The desorption of gas from the vacuum chamber of the 2-MeV electron storage ring at Cern
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1964 |
14 |
4 |
p. 160- 1 p. |
artikel |
153 |
The desorption of gas from the vacuum chamber of the 2-MeV electron storage ringer at CERN
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
154 |
The electric vacuum gyro
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1964 |
14 |
4 |
p. 165- 1 p. |
artikel |
155 |
The excitation of inert gases in the positive column of a direct current discharge at medium pressures. III. Upper levels of neon and argon
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1964 |
14 |
4 |
p. 162- 1 p. |
artikel |
156 |
The geometrical focusing of high velocity corpuscular rays emanating from cathodes of arbitrary size
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1964 |
14 |
4 |
p. 166-167 2 p. |
artikel |
157 |
The inclusion of inert gas ions in tungsten and their thermal desorption
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1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
158 |
The inclusion of inert gas ions in tungsten and their thermal desorption (0–5 keV)
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1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
159 |
The interaction of gases and solids in practical devices
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1964 |
14 |
4 |
p. 160- 1 p. |
artikel |
160 |
The interaction of gases and solids in practical devices
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
161 |
The mass spectrometric study of the reaction of methyl radicals with oxygen
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1964 |
14 |
4 |
p. 167- 1 p. |
artikel |
162 |
The mass spectrometric study of the reaction of methyl radicals with oxygen
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
163 |
The MC10 analysis cell of the Helitest 2002 leak detector
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
164 |
The MC10 analysis cell of the Helitest 2002 leak detector
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1964 |
14 |
4 |
p. 165- 1 p. |
artikel |
165 |
Theory of linearity of hot cathode ionization gauge
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
166 |
Theory of linearity of hot cathode ionization gauge
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1964 |
14 |
4 |
p. 157- 1 p. |
artikel |
167 |
Theory of the Klumb-Schwartz type radiometer gauge
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
168 |
Theory of the Klumb-Schwarz type radiometer gauge
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1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
169 |
The performance of a small rotating substrate holder for vacuum deposition
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
170 |
The performance of a small rotating substrate holder for vacuum deposition
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1964 |
14 |
4 |
p. 165- 1 p. |
artikel |
171 |
The pumping speed of titanium sputter pumps in ultra-high vacuum
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1964 |
14 |
4 |
p. 157- 1 p. |
artikel |
172 |
The pumping speed of titanium sputter pumps in ultra-high vacuum
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
173 |
The relationship between the excitation temperature and the gas temperature in the positive column of an arc discharge
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
174 |
Thermal transpiration effects of hydrogen, rare gases and methane
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1964 |
14 |
4 |
p. 169- 1 p. |
artikel |
175 |
Thermal transpiration effects of hydrogen, rare gases and methane
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1964 |
14 |
4 |
p. 158-159 2 p. |
artikel |
176 |
The setting-up of a team of specialists for tightness control of diffusion plants. Description of centre established at La Palul by the General Vacuum Company
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1964 |
14 |
4 |
p. 159- 1 p. |
artikel |
177 |
The setting up of a team of specialists for tightness control of diffusion plants. Description of the centre established at La Palul by the General Vacuum Company
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1964 |
14 |
4 |
p. 164-165 2 p. |
artikel |
178 |
The sorption of noble gas positive ions of medium energies at metallic surfaces
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1964 |
14 |
4 |
p. 160-161 2 p. |
artikel |
179 |
The sorption of noble positive ions of medium energies at metallic surfaces
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
180 |
The thermo-molecular pump, a new type of vacuum pump
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
181 |
The thermomolecular pump, a new type of vacuum pump
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1964 |
14 |
4 |
p. 158- 1 p. |
artikel |
182 |
The thermo-molecular pump, a new type of vacuum pump
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1964 |
14 |
4 |
p. 161- 1 p. |
artikel |
183 |
The use of clamp flanges in vacuum engineering
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
184 |
Thickness monitor for all types of vacuum deposits
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Sloan Instruments Corp., |
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1964 |
14 |
4 |
p. 152- 1 p. |
artikel |
185 |
Ultra-high vacuum and its applications
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Robinson, N.W. |
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1964 |
14 |
4 |
p. 149- 1 p. |
artikel |
186 |
Ultra-high vacuum ionization gauges with directly heated electrodes
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1964 |
14 |
4 |
p. 163- 1 p. |
artikel |
187 |
Units in vacuum measurement
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1964 |
14 |
4 |
p. 157- 1 p. |
artikel |
188 |
Units in vacuum measurement
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1964 |
14 |
4 |
p. 169- 1 p. |
artikel |
189 |
Units of vacuum measurement
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1964 |
14 |
4 |
p. 169- 1 p. |
artikel |
190 |
Units of vacuum measurement
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1964 |
14 |
4 |
p. 157- 1 p. |
artikel |
191 |
Use of a recording automatic microbalance in the vacuum evaporation of permalloy and indium antimonide thin films
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1964 |
14 |
4 |
p. 165- 1 p. |
artikel |
192 |
Use of a recording automatic microbalance in the vacuum evaporation of permalloy and indium antimonide thin films
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
193 |
Use of recording automatic microbalance in the vacuum evaporation of permalloy and indium antimonide films
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1964 |
14 |
4 |
p. 164- 1 p. |
artikel |
194 |
Vacuum evaporated silicon layers free from stacking faults
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1964 |
14 |
4 |
p. 168- 1 p. |
artikel |
195 |
Vacuum evaporated silicon layers free from stacking faults
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1964 |
14 |
4 |
p. 166- 1 p. |
artikel |
196 |
Validity of plasma temperatures obtained from emission lines of seeded metal atoms
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1964 |
14 |
4 |
p. 162- 1 p. |
artikel |