nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A flip chip interconnection and packaging system
|
|
|
1970 |
9 |
6 |
p. 456- 1 p. |
artikel |
2 |
An algorithm for the placement of large scale integrated circuit elements
|
|
|
1970 |
9 |
6 |
p. 459- 1 p. |
artikel |
3 |
Analysis of surface and bulk impurities in silicon single crystal slices by neutron activation
|
|
|
1970 |
9 |
6 |
p. 463- 1 p. |
artikel |
4 |
Analyzing and interpreting field failure data
|
|
|
1970 |
9 |
6 |
p. 453- 1 p. |
artikel |
5 |
Anomalous diffusion in semiconductors—A quantitative analysis
|
|
|
1970 |
9 |
6 |
p. 461- 1 p. |
artikel |
6 |
A redundancy analysis technique
|
|
|
1970 |
9 |
6 |
p. 454- 1 p. |
artikel |
7 |
Argon content of SiO2 films deposited by rf sputtering in argon
|
|
|
1970 |
9 |
6 |
p. 464- 1 p. |
artikel |
8 |
A software reliability program
|
|
|
1970 |
9 |
6 |
p. 456- 1 p. |
artikel |
9 |
A systems unavailability trade-off program
|
|
|
1970 |
9 |
6 |
p. 455- 1 p. |
artikel |
10 |
A unifying reliability analysis philosophy
|
|
|
1970 |
9 |
6 |
p. 455- 1 p. |
artikel |
11 |
Automatic impedance matching system for rf sputtering
|
|
|
1970 |
9 |
6 |
p. 465-466 2 p. |
artikel |
12 |
Automatic interconnection system for electronic components
|
|
|
1970 |
9 |
6 |
p. 459- 1 p. |
artikel |
13 |
A voltage variable resistor most
|
Townsend, W.G. |
|
1970 |
9 |
6 |
p. 491-496 6 p. |
artikel |
14 |
Berechnung der Kapazitäts-und Induktivitätsbeläge ebener Streifenleitungen durch konforme Abbildung
|
|
|
1970 |
9 |
6 |
p. 460- 1 p. |
artikel |
15 |
Bipolar compatible MOS ICs
|
|
|
1970 |
9 |
6 |
p. 463- 1 p. |
artikel |
16 |
BS9000 and integrated circuits
|
|
|
1970 |
9 |
6 |
p. 450- 1 p. |
artikel |
17 |
Bulk trapping effect on carrier diffusion length as determined by the surface photovoltage method: Theory
|
|
|
1970 |
9 |
6 |
p. 462-463 2 p. |
artikel |
18 |
Calculation of the current density in the contacts of a thin film resistor
|
|
|
1970 |
9 |
6 |
p. 464- 1 p. |
artikel |
19 |
Calendar of International Conferences, Symposia, Lectures and Meetings of Interest
|
|
|
1970 |
9 |
6 |
p. 440-442 3 p. |
artikel |
20 |
Call for paper
|
|
|
1970 |
9 |
6 |
p. 443-444 2 p. |
artikel |
21 |
Characteristics of aluminum-silicon Schottky barrier diode
|
|
|
1970 |
9 |
6 |
p. 460-461 2 p. |
artikel |
22 |
Characteristic traits of semiconductor failures
|
|
|
1970 |
9 |
6 |
p. 452- 1 p. |
artikel |
23 |
Circuit design selection—A reliability factor
|
|
|
1970 |
9 |
6 |
p. 454- 1 p. |
artikel |
24 |
Comment on the paper “failure of aluminium contacts to silicon in shallow diffused transistors”
|
Cunningham, J.A. |
|
1970 |
9 |
6 |
p. 515-516 2 p. |
artikel |
25 |
Computerized reliability analysis using REACT
|
|
|
1970 |
9 |
6 |
p. 450- 1 p. |
artikel |
26 |
Computers are like cancer because they are completely out of sync with their total environment
|
Gianelle, W.H. |
|
1970 |
9 |
6 |
p. 437- 1 p. |
artikel |
27 |
Configuration management: The interface of enigneering, production, and quality control
|
|
|
1970 |
9 |
6 |
p. 448- 1 p. |
artikel |
28 |
Contribution of discrete and flat thick film resistors to logic circuit reliability
|
|
|
1970 |
9 |
6 |
p. 465- 1 p. |
artikel |
29 |
Controlled collapse reflow chip joining
|
|
|
1970 |
9 |
6 |
p. 457-458 2 p. |
artikel |
30 |
Correlation of reliability performance measurements
|
|
|
1970 |
9 |
6 |
p. 455- 1 p. |
artikel |
31 |
Courses in microelectronics and reliability
|
|
|
1970 |
9 |
6 |
p. 438-439 2 p. |
artikel |
32 |
Deep levels within the forbidden gap of silicon-on-sapphire films
|
|
|
1970 |
9 |
6 |
p. 461- 1 p. |
artikel |
33 |
Design of reliable yet economical industrial control systems
|
|
|
1970 |
9 |
6 |
p. 453- 1 p. |
artikel |
34 |
Detection of internal crystal imperfections
|
|
|
1970 |
9 |
6 |
p. 452- 1 p. |
artikel |
35 |
Determining optimum reliability programs
|
|
|
1970 |
9 |
6 |
p. 449- 1 p. |
artikel |
36 |
Die Berechnung des komplexen Widerstandes von Dünnschichtkondensatoren
|
|
|
1970 |
9 |
6 |
p. 465- 1 p. |
artikel |
37 |
Dielectric films for Ge planar devices
|
|
|
1970 |
9 |
6 |
p. 463- 1 p. |
artikel |
38 |
Dynamic performance of Schottky-barrier field-effect transistors
|
|
|
1970 |
9 |
6 |
p. 459-460 2 p. |
artikel |
39 |
Electrical properties of silicon doped with platinum
|
|
|
1970 |
9 |
6 |
p. 460- 1 p. |
artikel |
40 |
Electromigration in integrated circuits
|
|
|
1970 |
9 |
6 |
p. 451- 1 p. |
artikel |
41 |
Electron tunneling and contact resistance of metal-silicon contact barriers
|
|
|
1970 |
9 |
6 |
p. 461- 1 p. |
artikel |
42 |
Establishment of a redundancy priority for spacecraft elements
|
|
|
1970 |
9 |
6 |
p. 454- 1 p. |
artikel |
43 |
Failure analysis as a tool for determining semiconductor screens
|
|
|
1970 |
9 |
6 |
p. 456- 1 p. |
artikel |
44 |
Failure rate distribution of electronic components
|
Grange, J.M. |
|
1970 |
9 |
6 |
p. 511-513 3 p. |
artikel |
45 |
F-111A Reliability
|
|
|
1970 |
9 |
6 |
p. 454- 1 p. |
artikel |
46 |
Fault trees for reliability analysis
|
|
|
1970 |
9 |
6 |
p. 449-450 2 p. |
artikel |
47 |
Flip-chip/beam-lead microbonding techniques
|
|
|
1970 |
9 |
6 |
p. 458- 1 p. |
artikel |
48 |
Gain degradation in planar transistors following emitter-base reverse biassing
|
|
|
1970 |
9 |
6 |
p. 450-451 2 p. |
artikel |
49 |
Generating IC artwork automatically saves time, prevents costly errors
|
|
|
1970 |
9 |
6 |
p. 458- 1 p. |
artikel |
50 |
Graphical method for the determination of junction parameters and of multiplication parameters
|
|
|
1970 |
9 |
6 |
p. 460- 1 p. |
artikel |
51 |
High-frequency properties and uses of MIS varactors
|
|
|
1970 |
9 |
6 |
p. 463-464 2 p. |
artikel |
52 |
High-speed interconnections using ECL-TC
|
|
|
1970 |
9 |
6 |
p. 457- 1 p. |
artikel |
53 |
Homogeneous attenuation elements in thin film technique
|
|
|
1970 |
9 |
6 |
p. 464- 1 p. |
artikel |
54 |
Hybrid integrated circuits with beam lead silicon chips and beam lead subcarriers
|
|
|
1970 |
9 |
6 |
p. 457- 1 p. |
artikel |
55 |
Hybrid microelectronics modules designed using basic thermal design guidelines
|
|
|
1970 |
9 |
6 |
p. 456- 1 p. |
artikel |
56 |
Integration density and power dissipation of MOS and bipolar shift registers—A comparison
|
Kasperkovitz, D. |
|
1970 |
9 |
6 |
p. 497-501 5 p. |
artikel |
57 |
Introduction to microelectronics
|
G.W.A.D., |
|
1970 |
9 |
6 |
p. 467- 1 p. |
artikel |
58 |
Long-term storage and system reliability
|
|
|
1970 |
9 |
6 |
p. 453-454 2 p. |
artikel |
59 |
LSI reliability assessment and prediction
|
|
|
1970 |
9 |
6 |
p. 451-452 2 p. |
artikel |
60 |
Measurement of the ionization rates in diffused silicon p-n junctions
|
|
|
1970 |
9 |
6 |
p. 462- 1 p. |
artikel |
61 |
Metal bridging under planar oxide
|
|
|
1970 |
9 |
6 |
p. 451- 1 p. |
artikel |
62 |
Metal edge coverage and control of charge accumulation in rf shuttered insulators
|
|
|
1970 |
9 |
6 |
p. 463- 1 p. |
artikel |
63 |
Microwave properties of Schottky-barrier field-effect transistors
|
|
|
1970 |
9 |
6 |
p. 460- 1 p. |
artikel |
64 |
Micro-wire wrapping at 1·27 mm centres
|
|
|
1970 |
9 |
6 |
p. 458- 1 p. |
artikel |
65 |
Monolithic voltage regulators
|
|
|
1970 |
9 |
6 |
p. 460- 1 p. |
artikel |
66 |
MOS course—I. The basic structures
|
|
|
1970 |
9 |
6 |
p. 456- 1 p. |
artikel |
67 |
New beam-lead connection method boosts semiconductor memory yields
|
|
|
1970 |
9 |
6 |
p. 459- 1 p. |
artikel |
68 |
Non-destructive determination of carrier concentration in epitaxial silicon using a total internal reflection technique
|
|
|
1970 |
9 |
6 |
p. 461- 1 p. |
artikel |
69 |
On condition maintenance programs
|
|
|
1970 |
9 |
6 |
p. 455- 1 p. |
artikel |
70 |
On the separation of bulk and surface components of lifetime using the pulsed MOS capacitor
|
|
|
1970 |
9 |
6 |
p. 462- 1 p. |
artikel |
71 |
Open circuit voltage decay behavior of junction devices
|
|
|
1970 |
9 |
6 |
p. 461- 1 p. |
artikel |
72 |
Other approaches to integrated circuits
|
|
|
1970 |
9 |
6 |
p. 456- 1 p. |
artikel |
73 |
Papers to be published in future issues
|
|
|
1970 |
9 |
6 |
p. 468- 1 p. |
artikel |
74 |
People subsystem measurement for total reliability
|
|
|
1970 |
9 |
6 |
p. 450- 1 p. |
artikel |
75 |
Radio frequency sputtering in IC processing
|
|
|
1970 |
9 |
6 |
p. 459- 1 p. |
artikel |
76 |
Recent United Kingdom patents in microelectronics
|
|
|
1970 |
9 |
6 |
p. 445-447 3 p. |
artikel |
77 |
Re-emission of sputtered SiO2 during growth and its relation to film quality
|
|
|
1970 |
9 |
6 |
p. 465- 1 p. |
artikel |
78 |
Reliability at CNET
|
|
|
1970 |
9 |
6 |
p. 448- 1 p. |
artikel |
79 |
Reliability considerations pertinent to materials systems used in microbonding
|
|
|
1970 |
9 |
6 |
p. 457- 1 p. |
artikel |
80 |
Reliability factors in the design process
|
|
|
1970 |
9 |
6 |
p. 454- 1 p. |
artikel |
81 |
Reliability for N/C machines—A must!
|
|
|
1970 |
9 |
6 |
p. 453- 1 p. |
artikel |
82 |
Reliability physics—An assessment
|
|
|
1970 |
9 |
6 |
p. 450- 1 p. |
artikel |
83 |
Reliability physics investigation of integrated circuit failures
|
|
|
1970 |
9 |
6 |
p. 451- 1 p. |
artikel |
84 |
Reliability: SAS programme
|
|
|
1970 |
9 |
6 |
p. 452- 1 p. |
artikel |
85 |
Reliability testing uniformity, efficiency and economy needed
|
|
|
1970 |
9 |
6 |
p. 450- 1 p. |
artikel |
86 |
Repair queueing models for system availability
|
|
|
1970 |
9 |
6 |
p. 455- 1 p. |
artikel |
87 |
Review of vacuum deposition mechanisms—I.
|
|
|
1970 |
9 |
6 |
p. 464- 1 p. |
artikel |
88 |
Review of vacuum deposition mechanisms—II
|
|
|
1970 |
9 |
6 |
p. 465- 1 p. |
artikel |
89 |
Review of vacuum deposition mechanisms—III
|
|
|
1970 |
9 |
6 |
p. 466- 1 p. |
artikel |
90 |
Review of vacuum deposition mechanisms—IV
|
|
|
1970 |
9 |
6 |
p. 466- 1 p. |
artikel |
91 |
Role of product evaluation facility in reliability
|
|
|
1970 |
9 |
6 |
p. 449- 1 p. |
artikel |
92 |
Short pulse rating of integrated circuit conductors
|
Kroko, L.J. |
|
1970 |
9 |
6 |
p. 503-508 6 p. |
artikel |
93 |
Silicon and silicon-dioxide processing for high-frequency MESFET preparation
|
|
|
1970 |
9 |
6 |
p. 464- 1 p. |
artikel |
94 |
Small signal equivalent circuit of an isotype heterojunction dominated by traps
|
|
|
1970 |
9 |
6 |
p. 460- 1 p. |
artikel |
95 |
Sodium migration through electron-gun evaporated Al2O3 and double layer Al2O3-SiO2 structures
|
|
|
1970 |
9 |
6 |
p. 462- 1 p. |
artikel |
96 |
Some Bayes estimates of long-run availability in a two-state system
|
|
|
1970 |
9 |
6 |
p. 448- 1 p. |
artikel |
97 |
Some economic aspects of maintenance versus redundancy for manned space stations
|
|
|
1970 |
9 |
6 |
p. 455- 1 p. |
artikel |
98 |
Specification X-1414: A reliability milestone
|
|
|
1970 |
9 |
6 |
p. 449- 1 p. |
artikel |
99 |
Spin-wave energy and source of inhomogeneities in thin films
|
|
|
1970 |
9 |
6 |
p. 466- 1 p. |
artikel |
100 |
Sputtering materials for electronic applications
|
|
|
1970 |
9 |
6 |
p. 464- 1 p. |
artikel |
101 |
Standard items form troubleshooter for electronic systems on British jets
|
|
|
1970 |
9 |
6 |
p. 456- 1 p. |
artikel |
102 |
Superlattice and negative differential conductivity in semiconductors
|
|
|
1970 |
9 |
6 |
p. 463- 1 p. |
artikel |
103 |
Systematic design language an advanced layout tool for artwork
|
|
|
1970 |
9 |
6 |
p. 458- 1 p. |
artikel |
104 |
System effectiveness analysis of complex systems
|
|
|
1970 |
9 |
6 |
p. 452-453 2 p. |
artikel |
105 |
Systems effectiveness evaluations
|
|
|
1970 |
9 |
6 |
p. 453- 1 p. |
artikel |
106 |
Termination resistance in thick-film resistors
|
|
|
1970 |
9 |
6 |
p. 464- 1 p. |
artikel |
107 |
Testing of mulilayer printed circuits' reliability
|
|
|
1970 |
9 |
6 |
p. 452- 1 p. |
artikel |
108 |
The choice of reflow soldering method
|
|
|
1970 |
9 |
6 |
p. 458- 1 p. |
artikel |
109 |
The effectiveness of part pre-failure analysis
|
|
|
1970 |
9 |
6 |
p. 451- 1 p. |
artikel |
110 |
The low-power-drain microelectronic VHF amplifier
|
|
|
1970 |
9 |
6 |
p. 459- 1 p. |
artikel |
111 |
Theory of low frequency noise in Si MOST'S
|
|
|
1970 |
9 |
6 |
p. 459- 1 p. |
artikel |
112 |
The philosophy of reliability
|
|
|
1970 |
9 |
6 |
p. 450- 1 p. |
artikel |
113 |
The precision manufacture and registration of masks for vacuum evaporation
|
|
|
1970 |
9 |
6 |
p. 459- 1 p. |
artikel |
114 |
The reliability of the VC 10 ILS equipment
|
Sargeant, H. |
|
1970 |
9 |
6 |
p. 469-490 22 p. |
artikel |
115 |
The use of reflow soldered face bonded chips in hybrid integrated circuits
|
|
|
1970 |
9 |
6 |
p. 457- 1 p. |
artikel |
116 |
Thick film materials capabilities: 1969
|
|
|
1970 |
9 |
6 |
p. 466- 1 p. |
artikel |
117 |
Thick film technique—State of development and further outlooks
|
|
|
1970 |
9 |
6 |
p. 464-465 2 p. |
artikel |
118 |
Updating of reliability criteria documents
|
|
|
1970 |
9 |
6 |
p. 448-449 2 p. |
artikel |
119 |
Vapour-deposited thin-film diodes—A comparison
|
|
|
1970 |
9 |
6 |
p. 465- 1 p. |
artikel |
120 |
Variables in the thick-film screen printing process and their effect on register tolerances in large-scale production
|
|
|
1970 |
9 |
6 |
p. 466- 1 p. |
artikel |
121 |
Watt-megahertz ratings run second to high reliability in foreign r-f power transistors
|
|
|
1970 |
9 |
6 |
p. 452- 1 p. |
artikel |
122 |
X-ray measurement of elastic strain and annealing in semiconductors
|
|
|
1970 |
9 |
6 |
p. 461- 1 p. |
artikel |