nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A metal-oxide-semiconductor (MOS) hall element
|
|
|
1967 |
6 |
1 |
p. 75- 1 p. |
artikel |
2 |
A method for statistical tolerance calculation
|
|
|
1967 |
6 |
1 |
p. 67- 1 p. |
artikel |
3 |
A microelectronics interconnexion method
|
|
|
1967 |
6 |
1 |
p. 72-73 2 p. |
artikel |
4 |
A monolithic silicon class B hearing aid amplifier
|
|
|
1967 |
6 |
1 |
p. 80- 1 p. |
artikel |
5 |
An evaluation method for deposited thin film interfacial interconnexions
|
|
|
1967 |
6 |
1 |
p. 77- 1 p. |
artikel |
6 |
An integrated analog switch using a bidirectional transistor
|
|
|
1967 |
6 |
1 |
p. 80- 1 p. |
artikel |
7 |
Application of optoelectronics to semiconductor microcircuits
|
|
|
1967 |
6 |
1 |
p. 72- 1 p. |
artikel |
8 |
Applications of inorganic and organic thick films in electronic equipment
|
|
|
1967 |
6 |
1 |
p. 76-77 2 p. |
artikel |
9 |
Applying fasteners effectively
|
|
|
1967 |
6 |
1 |
p. 69- 1 p. |
artikel |
10 |
A prediction of the photoresist influence on integrated circuit yield
|
|
|
1967 |
6 |
1 |
p. 73- 1 p. |
artikel |
11 |
A versatile digital frequency synthesizer for use in mobile radio communication sets
|
|
|
1967 |
6 |
1 |
p. 79- 1 p. |
artikel |
12 |
Beam-lead technology
|
|
|
1967 |
6 |
1 |
p. 72- 1 p. |
artikel |
13 |
Capacitors
|
Girling, D.S. |
|
1967 |
6 |
1 |
p. 35-51 17 p. |
artikel |
14 |
Carrier concentration and minority carrier lifetime measurement in semiconductor epitaxial by the MOS capacitance method
|
|
|
1967 |
6 |
1 |
p. 74- 1 p. |
artikel |
15 |
Characteristics of non-vacuum deposited metal films for electronic circuitry
|
|
|
1967 |
6 |
1 |
p. 76- 1 p. |
artikel |
16 |
Circuit failure asymmetries for reliability improvement in digital circuits
|
|
|
1967 |
6 |
1 |
p. 71- 1 p. |
artikel |
17 |
Correlation techniques applied to evaluating vacuum deposition of thin film nichrome resistor arrays
|
|
|
1967 |
6 |
1 |
p. 77- 1 p. |
artikel |
18 |
Deposition of tin oxide system resistance film through the droplet flash vapour deposition process
|
|
|
1967 |
6 |
1 |
p. 76- 1 p. |
artikel |
19 |
Detection of resistivity variation in a semiconductor pellet with an electron beam
|
Munakata, C. |
|
1967 |
6 |
1 |
p. 27-32 6 p. |
artikel |
20 |
Dislocation reactions in silicon web-dendrite crystals
|
|
|
1967 |
6 |
1 |
p. 73- 1 p. |
artikel |
21 |
Editorial Board
|
|
|
1967 |
6 |
1 |
p. IFC- 1 p. |
artikel |
22 |
Effect of fast cooling on diffusion-induced imperfections in silicon
|
|
|
1967 |
6 |
1 |
p. 73- 1 p. |
artikel |
23 |
Electromechanical switching devices: reliability, life and the relevance of circuit design
|
|
|
1967 |
6 |
1 |
p. 69- 1 p. |
artikel |
24 |
Epitaxial deposition of cadmium selenide
|
|
|
1967 |
6 |
1 |
p. 78- 1 p. |
artikel |
25 |
Equilibrium potentials of isolated metal areas during electron beam bombardment polymerization
|
Geddes, K.R. |
|
1967 |
6 |
1 |
p. 17-24 8 p. |
artikel |
26 |
Evaluating sealed contacts
|
|
|
1967 |
6 |
1 |
p. 70- 1 p. |
artikel |
27 |
Failure analysis of microcircuitry by scanning electron microscopy
|
Thornton, P.R. |
|
1967 |
6 |
1 |
p. 9-14 6 p. |
artikel |
28 |
Frequency behaviour of diffused resistances
|
|
|
1967 |
6 |
1 |
p. 72- 1 p. |
artikel |
29 |
Infra-red: A new approach to thermal measurement for reliability
|
|
|
1967 |
6 |
1 |
p. 68- 1 p. |
artikel |
30 |
Infra-red interference spectra observed in silicon epitaxial wafers
|
|
|
1967 |
6 |
1 |
p. 74- 1 p. |
artikel |
31 |
Interstitial-substitutional diffusion in a finite medium, gold into silicon
|
|
|
1967 |
6 |
1 |
p. 73- 1 p. |
artikel |
32 |
Introducing redundancy in analog systems
|
|
|
1967 |
6 |
1 |
p. 67- 1 p. |
artikel |
33 |
Ion drift in the fringing field of MOS capacitors
|
|
|
1967 |
6 |
1 |
p. 75- 1 p. |
artikel |
34 |
Microcircuit photomasks from automatic techniques
|
|
|
1967 |
6 |
1 |
p. 72- 1 p. |
artikel |
35 |
Misfit dislocations in semiconductors
|
|
|
1967 |
6 |
1 |
p. 74- 1 p. |
artikel |
36 |
Multilayer circuit boards: sharpening an imperfect art
|
|
|
1967 |
6 |
1 |
p. 70- 1 p. |
artikel |
37 |
New trends in microelectronics fabrication technology 1965–1966 (Part 1)
|
|
|
1967 |
6 |
1 |
p. 71- 1 p. |
artikel |
38 |
Nomographic design of vacuum gasket seals
|
|
|
1967 |
6 |
1 |
p. 78- 1 p. |
artikel |
39 |
Overlay transistors move into microwave region
|
|
|
1967 |
6 |
1 |
p. 70- 1 p. |
artikel |
40 |
Packaging with laser welding
|
|
|
1967 |
6 |
1 |
p. 72- 1 p. |
artikel |
41 |
Parameter estimation for a generalized gamma distribution
|
|
|
1967 |
6 |
1 |
p. 68- 1 p. |
artikel |
42 |
Physics of failure and accelerated testing
|
|
|
1967 |
6 |
1 |
p. 69- 1 p. |
artikel |
43 |
Possiblities and limits of increasing reliability in communication engineering by redundancy (Part 2)
|
|
|
1967 |
6 |
1 |
p. 71- 1 p. |
artikel |
44 |
Prediction and engineering assessment in early design
|
|
|
1967 |
6 |
1 |
p. 71- 1 p. |
artikel |
45 |
Proper test-point allocation
|
|
|
1967 |
6 |
1 |
p. 80- 1 p. |
artikel |
46 |
Properties of indium oxide glaze resistors
|
|
|
1967 |
6 |
1 |
p. 76- 1 p. |
artikel |
47 |
Reliability as a management tool
|
|
|
1967 |
6 |
1 |
p. 67- 1 p. |
artikel |
48 |
Reliability of plated-through holes in multilayer boards
|
|
|
1967 |
6 |
1 |
p. 70- 1 p. |
artikel |
49 |
Reliability testing in a bayesian context
|
|
|
1967 |
6 |
1 |
p. 67- 1 p. |
artikel |
50 |
Resistor reliability, choice of type and influence of environment
|
Nichols, B.H. |
|
1967 |
6 |
1 |
p. 1-8 8 p. |
artikel |
51 |
Second breakdown and current distributions in transistors
|
|
|
1967 |
6 |
1 |
p. 70- 1 p. |
artikel |
52 |
Semiconductor device reliability evaluation and improvement on minuteman II CQAP
|
|
|
1967 |
6 |
1 |
p. 70- 1 p. |
artikel |
53 |
Service-life and reliability of mullard electrolytic capacitors
|
|
|
1967 |
6 |
1 |
p. 68-69 2 p. |
artikel |
54 |
Solion tetrode—A reliable integrator and memory device
|
|
|
1967 |
6 |
1 |
p. 71- 1 p. |
artikel |
55 |
Stability of palladium oxide resistive glaze films
|
Melan, E.H. |
|
1967 |
6 |
1 |
p. 53-54 2 p. |
artikel |
56 |
Tantalum film circuits
|
|
|
1967 |
6 |
1 |
p. 77- 1 p. |
artikel |
57 |
Testing co-axial cables
|
|
|
1967 |
6 |
1 |
p. 69- 1 p. |
artikel |
58 |
The binding entropy of point defects to dislocations
|
|
|
1967 |
6 |
1 |
p. 74- 1 p. |
artikel |
59 |
The composition and some physical properties of manganese oxide thin films
|
|
|
1967 |
6 |
1 |
p. 77-78 2 p. |
artikel |
60 |
The connector specifications
|
|
|
1967 |
6 |
1 |
p. 69- 1 p. |
artikel |
61 |
The degenerate semiconductor thin films—II. the longitudinal electrical conductivity
|
|
|
1967 |
6 |
1 |
p. 74- 1 p. |
artikel |
62 |
The degenerate semiconductor thin films—I. The fermi energy
|
|
|
1967 |
6 |
1 |
p. 73- 1 p. |
artikel |
63 |
The design of digital counters using micrologic elements
|
|
|
1967 |
6 |
1 |
p. 79-80 2 p. |
artikel |
64 |
The effect of moisture upon tantalum oxide thin film capacitors
|
|
|
1967 |
6 |
1 |
p. 78- 1 p. |
artikel |
65 |
The effects of fixed bulk charge on the characteristics of metal-oxide-semiconductor transistors
|
|
|
1967 |
6 |
1 |
p. 75- 1 p. |
artikel |
66 |
The effects of fixed bulk charge on the thermal noise in metal-oxide-seminconductor transistors
|
|
|
1967 |
6 |
1 |
p. 75- 1 p. |
artikel |
67 |
The etching and polishing behaviour of Ge and Si with HI
|
|
|
1967 |
6 |
1 |
p. 73- 1 p. |
artikel |
68 |
The failure of plastics insulants due to silver migration
|
|
|
1967 |
6 |
1 |
p. 68- 1 p. |
artikel |
69 |
The properties of Viton “A” elastomers—III. Steady state and transient activated gas emission processes from Viton “A”
|
|
|
1967 |
6 |
1 |
p. 79- 1 p. |
artikel |
70 |
The properties of Viton “A” elastomers—II. The influence of permeation diffusion, and solubility of gases on the gas emission rate from an O-ring used as an atmospheric seal or high vacuum immersed
|
|
|
1967 |
6 |
1 |
p. 79- 1 p. |
artikel |
71 |
The reliability of electronic systems
|
|
|
1967 |
6 |
1 |
p. 71- 1 p. |
artikel |
72 |
Thermal analysis of hybrid microcircuits
|
|
|
1967 |
6 |
1 |
p. 72- 1 p. |
artikel |
73 |
The use of X-ray diffraction to study defects occurring during silicon-device manufacture
|
|
|
1967 |
6 |
1 |
p. 75-76 2 p. |
artikel |
74 |
Thin film hafnium-hafnium dioxide capacitors
|
|
|
1967 |
6 |
1 |
p. 77- 1 p. |
artikel |
75 |
Tin and zinc diffusion into gallium arsenide from doped silicon dioxide layers
|
|
|
1967 |
6 |
1 |
p. 74- 1 p. |
artikel |
76 |
Tungsten carbide-tungaten resistive glazes
|
|
|
1967 |
6 |
1 |
p. 78- 1 p. |
artikel |
77 |
Ultrahigh vacuum station for thin film and residual gas analysis studies
|
|
|
1967 |
6 |
1 |
p. 78-79 2 p. |
artikel |
78 |
Vacuum deposited molybdenum films
|
|
|
1967 |
6 |
1 |
p. 78- 1 p. |
artikel |
79 |
What is meaningful integrated-circuit reliability?
|
|
|
1967 |
6 |
1 |
p. 67-68 2 p. |
artikel |