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                             244 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A current pulse screening test for metal step coverage—final report 1975
14 3 p. 263-
1 p.
artikel
2 Advances in low temperature die bonding techniques 1975
14 3 p. 272-
1 p.
artikel
3 A few examples of applying laser microspectral analysis in semiconductor engineering 1975
14 3 p. 285-
1 p.
artikel
4 Ake 13—Software reliability aspects 1975
14 3 p. 270-
1 p.
artikel
5 A life-test study of electromigration in microwave power transistors 1975
14 3 p. 265-
1 p.
artikel
6 A low power RC-coupled VHF amplifier designed for fabrication by hybrid microcircuit techniques. Technical memo 1975
14 3 p. 284-
1 p.
artikel
7 A model for the failure of bipolar silicon integrated circuits subjected to electrostatic discharge 1975
14 3 p. 264-
1 p.
artikel
8 An accurate computer analysis of relaxation effects in MOS capacitors 1975
14 3 p. 274-
1 p.
artikel
9 An alternative approach to a reliability problem 1975
14 3 p. 268-
1 p.
artikel
10 Analysis and improvement of a static shift register 1975
14 3 p. 275-
1 p.
artikel
11 Analyzing the interface of reliability and economics of unmanned satellites 1975
14 3 p. 267-268
2 p.
artikel
12 An application of Markov chains for the evaluation of the operating characteristics of chain sampling inspection plans 1975
14 3 p. 262-
1 p.
artikel
13 An approach for evaluating Polymer materials as protective coatings on hybrid microcircuits 1975
14 3 p. 284-285
2 p.
artikel
14 A new approach to reliability prediction 1975
14 3 p. 262-
1 p.
artikel
15 An integrated circuit two-tone generator 1975
14 3 p. 274-275
2 p.
artikel
16 An investigation into the use of computer aided design in thick film circuits 1975
14 3 p. 283-
1 p.
artikel
17 A note on reliability prediction of electronic equipment (MIL-HDBK-217B) Reiche, H.
1975
14 3 p. 252-
1 p.
artikel
18 A personal view of some reliability activities in the United Kingdom 1975
14 3 p. 261-
1 p.
artikel
19 Application de la gravure ionique a la microelectronique 1975
14 3 p. 286-
1 p.
artikel
20 A program system for safeguarding the availability of the Siemens system EDS 1975
14 3 p. 269-
1 p.
artikel
21 Arinc research corporation five-day courses reliability and maintainability techniques 1975
14 3 p. 259-
1 p.
artikel
22 As clipper, IC comparator is improved by feedback 1975
14 3 p. 274-
1 p.
artikel
23 A self-consistent calculation of effective intrinsic concentration in heavily-doped silicon 1975
14 3 p. 280-
1 p.
artikel
24 A special type of reliable circuit 1975
14 3 p. 267-
1 p.
artikel
25 A stable delay multivibrator using a linear IC chip 1975
14 3 p. 274-
1 p.
artikel
26 A systems approach to the design of MOS memory components 1975
14 3 p. 275-
1 p.
artikel
27 A thin-film/semiconductor thermocouple for microwave power measurements 1975
14 3 p. 282-
1 p.
artikel
28 A treatment of impurity diffusion in oxidizing ambients 1975
14 3 p. 280-281
2 p.
artikel
29 A UHF thick film tuner 1975
14 3 p. 283-
1 p.
artikel
30 Automating the epitaxial process 1975
14 3 p. 271-
1 p.
artikel
31 Automation applied to repair and maintenance of electronic systems 1975
14 3 p. 269-
1 p.
artikel
32 Availibility as a criterion of system performance 1975
14 3 p. 269-270
2 p.
artikel
33 Avalanche-injected electron currents in SiO2 at high injection densities 1975
14 3 p. 279-
1 p.
artikel
34 Bayes estimation in life testing and reliability: a multivariate case 1975
14 3 p. 267-
1 p.
artikel
35 Better Bipolar-MOS process yields linear ICs with good ac and dc specs 1975
14 3 p. 271-
1 p.
artikel
36 Bipolar LSI computing elements usher in new era of digital design 1975
14 3 p. 274-
1 p.
artikel
37 Bipolar memories 1975
14 3 p. 276-
1 p.
artikel
38 Bi-polar technology. A re-evaluation 1975
14 3 p. 277-
1 p.
artikel
39 Bi-polar technology. Integrated injection logic—present and future 1975
14 3 p. 276-
1 p.
artikel
40 Calendar of international conferences, symposia, lectures and meetings of interest 1975
14 3 p. 251-252
2 p.
artikel
41 Characterisation of silicon metallization systems using energetic ion backscattering 1975
14 3 p. 278-
1 p.
artikel
42 Characterization of a chromium-gold deposition process for the production of thin film hybrid microcircuits 1975
14 3 p. 284-
1 p.
artikel
43 Charge-transfer devices filter complex communications signals 1975
14 3 p. 274-
1 p.
artikel
44 C-MOS—a status report 1975
14 3 p. 276-
1 p.
artikel
45 C-MOS specifications: Don't take them for granted 1975
14 3 p. 270-
1 p.
artikel
46 Comparative advantages of in-house custom design of MOS LSI 1975
14 3 p. 271-
1 p.
artikel
47 Comparison of the structure of amorphous Ge and GaAs 1975
14 3 p. 280-
1 p.
artikel
48 Compliant beam lead bonding 1975
14 3 p. 271-272
2 p.
artikel
49 Component reliability under environmental stress 1975
14 3 p. 266-
1 p.
artikel
50 Component reliability under nuclear radiation environment 1975
14 3 p. 263-
1 p.
artikel
51 Computer-aided sequential testing for equipment reliability 1975
14 3 p. 268-
1 p.
artikel
52 Computer controlled electron-beam projection mask aligner 1975
14 3 p. 285-
1 p.
artikel
53 Conduction mechanisms in thick film microcircuits. Semiannual technical report 1975
14 3 p. 285-
1 p.
artikel
54 Control of electrostatic discharge damage to semiconductors 1975
14 3 p. 265-
1 p.
artikel
55 Critical parameters in glass sealed ceramic packages 1975
14 3 p. 282-
1 p.
artikel
56 Current-voltage characteristics, dielectric breakdown and potential distribution measurements in Au-SiOx-Au thin film diodes and triodes 1975
14 3 p. 282-
1 p.
artikel
57 Decision theoretic approach to the design of reliability systems Singh, N.
1975
14 3 p. 315-318
4 p.
artikel
58 Defect creation in electronic materials 1975
14 3 p. 263-
1 p.
artikel
59 Degradation of gold-germanium ohmic contact to n-GaAs 1975
14 3 p. 265-
1 p.
artikel
60 Degradation of oxide films due to radiation effects in exposure to plasmas in sputter deposition and backsputtering 1975
14 3 p. 278-
1 p.
artikel
61 Design of polymer resists for electron lithography 1975
14 3 p. 271-
1 p.
artikel
62 design of systems and circuits for maximum reliability or maximum production Yield 1975
14 3 p. 260-
1 p.
artikel
63 Design validation for reliable LSI circuits 1975
14 3 p. 266-
1 p.
artikel
64 Detection by Auger electron spectroscopy and removal by ozonization of photoresist residues 1975
14 3 p. 272-
1 p.
artikel
65 Determination of the semiconductor doping profile right up to its surface using the MIS capacitor 1975
14 3 p. 281-
1 p.
artikel
66 Diagnosis of equipment failures by pattern recognition 1975
14 3 p. 268-
1 p.
artikel
67 Die bond failure modes 1975
14 3 p. 264-
1 p.
artikel
68 Dielectric thin-film branching waveguide 1975
14 3 p. 282-
1 p.
artikel
69 Diffusion near an absorbing boundary 1975
14 3 p. 280-
1 p.
artikel
70 Diverse industry users clamber aboard the micropressor bandwagon 1975
14 3 p. 275-
1 p.
artikel
71 Effect of disorder on direct and indirect band gaps of semiconductor alloys 1975
14 3 p. 277-
1 p.
artikel
72 Effect of temperature and voltage sweep rate on C-V characteristics of MIS capacitors 1975
14 3 p. 273-
1 p.
artikel
73 Electrical characterization of complex microcircuits. Final technical report 1975
14 3 p. 270-
1 p.
artikel
74 Electromigration failure in Al thin films under constant and reversed d.c. powering 1975
14 3 p. 262-263
2 p.
artikel
75 Electron bombarded semiconductor devices 1975
14 3 p. 285-
1 p.
artikel
76 Electron irradiation damage in silicon containing carbon and diffused 18O 1975
14 3 p. 285-
1 p.
artikel
77 Erratum 1975
14 3 p. 319-
1 p.
artikel
78 Establishment of reliability data for power plant components by means of an information system 1975
14 3 p. 268-
1 p.
artikel
79 Extreme value characteristics of distributions of cumulative processes 1975
14 3 p. 261-
1 p.
artikel
80 Fabrication techniques for surface-acoustic-wave and thin-film optical devices 1975
14 3 p. 272-
1 p.
artikel
81 Failure analysis of AUTODIN microelectronics, technical rept. 1975
14 3 p. 265-
1 p.
artikel
82 Failure mechanisms in gold and aluminum microwave power transistors 1975
14 3 p. 264-265
2 p.
artikel
83 Failure mode effects and criticality analysis (FMECA) and planned maintenance applied to TXE 4 electronic switching system 1975
14 3 p. 270-
1 p.
artikel
84 Fault clearance in the periphery of stored-program controlled telephone switching systems with the aid of a central service computer (SC) 1975
14 3 p. 269-
1 p.
artikel
85 FCL: key partner in integrated-circuit design 1975
14 3 p. 271-
1 p.
artikel
86 Field-enhanced carrier generation in MOS capacitors 1975
14 3 p. 273-
1 p.
artikel
87 For solid-state watches the time is at hand 1975
14 3 p. 275-
1 p.
artikel
88 Frequency dependence of ΔV/Δ (C−2 ) of MOS capacitors 1975
14 3 p. 273-
1 p.
artikel
89 Fundamental physical limitations in integrated circuits 1975
14 3 p. 270-
1 p.
artikel
90 Further studies on thin film structures of metal-borosilicate glass-metal 1975
14 3 p. 282-
1 p.
artikel
91 Gas and smoke detector uses low-leakage MOS transistor 1975
14 3 p. 274-
1 p.
artikel
92 GEISHA semiconductor reliability studies. A portion of CHAIR-GEISHA—Final Report 1975
14 3 p. 266-
1 p.
artikel
93 Gold scavenging characteristics of bonding alloys 1975
14 3 p. 281-
1 p.
artikel
94 High reliability photodiodes for space applications Brilman, M.
1975
14 3 p. 305-306
2 p.
artikel
95 High resolution Fourier transform spectroscopy of shallow acceptors in ultra-pure germanium 1975
14 3 p. 278-
1 p.
artikel
96 Hot hole anisotropic effect in silicon and germanium 1975
14 3 p. 278-
1 p.
artikel
97 Hybrid microcircuit reliability data 1975
14 3 p. 253-
1 p.
artikel
98 Hybrid passive components—packaging 1975
14 3 p. 284-
1 p.
artikel
99 IC op amp has C-MOS output 1975
14 3 p. 274-
1 p.
artikel
100 IC voltage regulators 1975
14 3 p. 276-
1 p.
artikel
101 I2L takes bipolar integration a significant step forward 1975
14 3 p. 273-
1 p.
artikel
102 Improved conventional photolithography by relief mask processing 1975
14 3 p. 281-
1 p.
artikel
103 Influence of carriers on the capacitance of p-n junctions with deep donors 1975
14 3 p. 278-279
2 p.
artikel
104 Integrated temperature transducers 1975
14 3 p. 274-
1 p.
artikel
105 Interfacing a source utilizing low perveance ion beam extraction to a beam transport system suitable for ion implantation 1975
14 3 p. 286-
1 p.
artikel
106 Ion implantation boosts threshold of JFET breakdown 1975
14 3 p. 285-
1 p.
artikel
107 Ion-implanted semiconductor devices 1975
14 3 p. 285-286
2 p.
artikel
108 Ionizable materials to produce ions for implantation 1975
14 3 p. 286-
1 p.
artikel
109 Large-area uniform evaporated thin films 1975
14 3 p. 283-
1 p.
artikel
110 Laser trimming of thick film resistors 1975
14 3 p. 285-
1 p.
artikel
111 LIC technology 1975
14 3 p. 276-
1 p.
artikel
112 Linear and interface circuits 1975
14 3 p. 276-
1 p.
artikel
113 Literature survey on structural reliability 1975
14 3 p. 262-
1 p.
artikel
114 Low firing temperature resistors for use on glass 1975
14 3 p. 283-
1 p.
artikel
115 Low-speed counter uses low-priced calculator chip 1975
14 3 p. 275-
1 p.
artikel
116 Low voltage dynamic MOS memory 1975
14 3 p. 275-
1 p.
artikel
117 LSI yield projections based upon test pattern results: an application to multilevel metal structures 1975
14 3 p. 272-273
2 p.
artikel
118 Marketing hybrid integrated circuits 1975
14 3 p. 282-
1 p.
artikel
119 Median-time-to-failure (MTF) of an L-Band power transistor under RF conditions 1975
14 3 p. 264-
1 p.
artikel
120 Metallization corrosion in silicon devices by moisture-induced electrolysis 1975
14 3 p. 263-264
2 p.
artikel
121 Metal-semiconductor contacts prepared by ion implantation 1975
14 3 p. 285-
1 p.
artikel
122 Method of calculation of the impurity obtained by a multiple diffusion process 1975
14 3 p. 277-278
2 p.
artikel
123 Method of predicting the reliability during the development of a switching system 1975
14 3 p. 269-
1 p.
artikel
124 Methods and procedures for computer based handling of components reliability data at FTL (The Swedish Military Electronics Laboratory) 1975
14 3 p. 263-
1 p.
artikel
125 Microcircuit device malfunction report 1975
14 3 p. 253-
1 p.
artikel
126 Microprocessor directs wafer-prober 1975
14 3 p. 272-
1 p.
artikel
127 Microprocessors expand industry applications of data acquisition 1975
14 3 p. 270-
1 p.
artikel
128 Millimeter-wave integrated circuits 1975
14 3 p. 275-
1 p.
artikel
129 Mixed-discipline monolithic integrated circuits—bipolar, MOS and COS/MOS technologies and future trends 1975
14 3 p. 276-
1 p.
artikel
130 Model of doped-oxide-source diffusion in silicon 1975
14 3 p. 278-
1 p.
artikel
131 Moisture in SC packages 1975
14 3 p. 272-
1 p.
artikel
132 Molecular bonding conductive films 1975
14 3 p. 272-
1 p.
artikel
133 Monte-Carlo calculation of electron transport in polar semiconductors 1975
14 3 p. 279-
1 p.
artikel
134 MOS and bipolar ICs in consumer applications 1975
14 3 p. 275-276
2 p.
artikel
135 MOS in the telephone exchange 1975
14 3 p. 274-
1 p.
artikel
136 MOS technology—MOS a major factor 1975
14 3 p. 276-
1 p.
artikel
137 MOS technology. Opening statement 1975
14 3 p. 276-277
2 p.
artikel
138 N. Channel MOS memories—new possibilities for microprocessor memory design 1975
14 3 p. 275-
1 p.
artikel
139 New alumina substrate for hybrid integrated circuits 1975
14 3 p. 284-
1 p.
artikel
140 New applications of linear integrated circuits in the entertainment industry 1975
14 3 p. 275-
1 p.
artikel
141 New move towards electronic parts reliability standards 1975
14 3 p. 262-
1 p.
artikel
142 Non-ionic room temperature instabilities in MOS devices 1975
14 3 p. 280-
1 p.
artikel
143 Ohmic hole mobility in cubic semiconductors 1975
14 3 p. 277-
1 p.
artikel
144 On the software reliability 1975
14 3 p. 268-269
2 p.
artikel
145 Operational behaviour of a complex system having shelf-life of the components under preemptive resume repair discipline 1975
14 3 p. 264-
1 p.
artikel
146 Parametric effects in thin film niobium Josephson junctions 1975
14 3 p. 282-
1 p.
artikel
147 Photosensitive thick film paste 1975
14 3 p. 283-
1 p.
artikel
148 Physical and thermodynamic properties of semiconductor industry chemical materials 1975
14 3 p. 273-
1 p.
artikel
149 Plasma etching as applied to failure analysis 1975
14 3 p. 266-
1 p.
artikel
150 Plasma etching PROMS and other problems 1975
14 3 p. 273-
1 p.
artikel
151 Prediction of avalanche breakdown voltage in silicon step junctions 1975
14 3 p. 279-
1 p.
artikel
152 Principal component analysis of production data 1975
14 3 p. 267-
1 p.
artikel
153 Problems in the analysis of semiconductor device materials exposed to ionizing radiation 1975
14 3 p. 278-
1 p.
artikel
154 Process III—A new high performance bipolar process 1975
14 3 p. 271-
1 p.
artikel
155 Programmable surface acoustic wave devices utilizing hybrid microelectronic techniques 1975
14 3 p. 281-
1 p.
artikel
156 Projection mask alignment—problems and solutions 1975
14 3 p. 273-
1 p.
artikel
157 Properties of Au, Pt, Pd and Rh levels in silicon measured with a constant capacitance technique 1975
14 3 p. 279-
1 p.
artikel
158 Quality assurance and the large customer the modern concept 1975
14 3 p. 262-
1 p.
artikel
159 Radiation effects on semiconductor devices 1975
14 3 p. 270-
1 p.
artikel
160 Range and standard deviation of ion-implanted phosphorus and boron in silicon 1975
14 3 p. 286-
1 p.
artikel
161 Recent development in silicon-device technology at “LAMEL” 1975
14 3 p. 270-271
2 p.
artikel
162 Regulating voltage with just one quad IC and one supply 1975
14 3 p. 274-
1 p.
artikel
163 Reliabile software for SPC systems 1975
14 3 p. 269-
1 p.
artikel
164 Reliability achievement in the IBM 3750 1975
14 3 p. 269-
1 p.
artikel
165 Reliability analysis of a 2-dissimilar units redundant system with Erlang-failure and general repair distributions 1975
14 3 p. 269-
1 p.
artikel
166 Reliability analysis of large repairable systems 1975
14 3 p. 268-
1 p.
artikel
167 1975 reliability and maintainability symposium 1975
14 3 p. 253-259
7 p.
artikel
168 Reliability assessment of a semiconductor memory by design analysis 1975
14 3 p. 268-
1 p.
artikel
169 Reliability considerations in the design and fabrication of polysilicon fusable link PROM's 1975
14 3 p. 269-
1 p.
artikel
170 Reliability design of a maintained system 1975
14 3 p. 268-
1 p.
artikel
171 Reliability efforts in large European programs for military and commercial aircraft development 1975
14 3 p. 266-267
2 p.
artikel
172 Reliability evaluation of communication systems using flow graphs 1975
14 3 p. 268-
1 p.
artikel
173 Reliability of nondeteriorating devices 1975
14 3 p. 267-
1 p.
artikel
174 Reliability of silicon and gallium arsenide K a -bandIMPATT diodes 1975
14 3 p. 266-
1 p.
artikel
175 Reliability of statically controlled drives Kohli, D.R.
1975
14 3 p. 287-292
6 p.
artikel
176 Reliability optimization through random search algorithm 1975
14 3 p. 267-
1 p.
artikel
177 Reliability prediction of silicon bipolar transistors by means of noise measurements 1975
14 3 p. 264-
1 p.
artikel
178 Reliability studies of Gunn diodes 1975
14 3 p. 264-
1 p.
artikel
179 Reliability study of an N-channel silicon gate FET with field shield 1975
14 3 p. 265-
1 p.
artikel
180 Reliability targets—are they valid and can they be specified 1975
14 3 p. 262-
1 p.
artikel
181 Results of production thermal cycle screening 1975
14 3 p. 266-
1 p.
artikel
182 Schottky components are byte-sized 1975
14 3 p. 274-
1 p.
artikel
183 Screenability and Rheology 1975
14 3 p. 284-
1 p.
artikel
184 Screen: Essential tool for thick film printing 1975
14 3 p. 284-
1 p.
artikel
185 Scribing and breaking of semiconductor wafers 1975
14 3 p. 272-
1 p.
artikel
186 See-through masks aid semiconductor device manufacturing 1975
14 3 p. 273-
1 p.
artikel
187 Semiconductor measurement technology: ARPA/NBS workshop I. Measurement problems in integrated circuit processing and assembly. Special publication 1975
14 3 p. 272-
1 p.
artikel
188 Semiconductor measurement technology: microelectronic ultrasonic bonding. Special publication 1975
14 3 p. 272-
1 p.
artikel
189 Sequential life tests 1975
14 3 p. 268-
1 p.
artikel
190 Signal-flow graphs in reliability theory 1975
14 3 p. 262-
1 p.
artikel
191 Silicone resins for semiconductor protection 1975
14 3 p. 270-
1 p.
artikel
192 Simple radiation defects in semiconductors and their temperature transformations 1975
14 3 p. 263-
1 p.
artikel
193 Simplification method of fault detection making monoterm degeneration compatible with functional completeness 1975
14 3 p. 268-
1 p.
artikel
194 Single-chip micro processor employs minicomputer word length 1975
14 3 p. 275-
1 p.
artikel
195 Some applications of regenerative stochastic processes to Reliability Theory—Part 1: Tutorial Introduction 1975
14 3 p. 261-262
2 p.
artikel
196 Some aspects of damage models 1975
14 3 p. 267-
1 p.
artikel
197 Some characteristics of ion implanted resistors 1975
14 3 p. 286-
1 p.
artikel
198 Some reliability aspects of electron bombarded semiconductor power devices 1975
14 3 p. 263-
1 p.
artikel
199 Some reliability characteristics of CRT cathode assemblies 1975
14 3 p. 264-
1 p.
artikel
200 Some thoughts on the reliability of telecommunication networks 1975
14 3 p. 269-
1 p.
artikel
201 Stability and deterioration mechanism of thick film resistors 1975
14 3 p. 281-
1 p.
artikel
202 State of reliability effort in Europe 1975
14 3 p. 261-
1 p.
artikel
203 Static electrificatio hazards in microelectronics production 1975
14 3 p. 270-
1 p.
artikel
204 Stationary room temperature MOS-C deep-depletion characteristics 1975
14 3 p. 280-
1 p.
artikel
205 Step-stress failure rate models for electronic components 1975
14 3 p. 263-
1 p.
artikel
206 Stochastic behaviour of a two-unit priority standby redundant system with repair Nakagawa, Toshio
1975
14 3 p. 309-313
5 p.
artikel
207 Surface breakdown in silicon planar junctions—a computer-aided experimental determination of the critical field 1975
14 3 p. 279-
1 p.
artikel
208 Surface states in the conduction band region of Si 1975
14 3 p. 280-
1 p.
artikel
209 Surface-state spectra from thick-oxide MOS tunnel junctions 1975
14 3 p. 279-
1 p.
artikel
210 Susceptibility of semiconductor devices to thermal second breakdown 1975
14 3 p. 265-
1 p.
artikel
211 Technology teamwork—MOS and bipolar 1975
14 3 p. 275-
1 p.
artikel
212 The accelerated testing of plastic encapsulated semiconductor components 1975
14 3 p. 265-
1 p.
artikel
213 The advantages of thin film hybrids in instruments 1975
14 3 p. 282-
1 p.
artikel
214 The application of reliability and mainatainability techniques 1975
14 3 p. 259-260
2 p.
artikel
215 The case for component burn-in: the gain is well worth the price 1975
14 3 p. 266-
1 p.
artikel
216 The comparison of RF sputtering systems 1975
14 3 p. 281-
1 p.
artikel
217 The confusion in the quality field 1975
14 3 p. 262-
1 p.
artikel
218 The corrosive activity of fluxes Bochenek, Andrzej
1975
14 3 p. 295-303
9 p.
artikel
219 The evaluation of radiation damaged epitaxial silicon 1975
14 3 p. 279-280
2 p.
artikel
220 The Ferranti CDI process and its achievements 1975
14 3 p. 271-
1 p.
artikel
221 The gate-controlled diode so measurement and steady-state lateral current flow in deeply depleted MOS structures 1975
14 3 p. 277-
1 p.
artikel
222 The impact of technological change in the semiconductor industry 1975
14 3 p. 277-
1 p.
artikel
223 The long-term reliability of plastics encapsulated microelectronic devices—corrosion and the role of adhesion 1975
14 3 p. 262-
1 p.
artikel
224 Thermal characteristics of ICs gain in importance 1975
14 3 p. 273-
1 p.
artikel
225 Thermally stimulated current measurements on silicon junctions produced by implantation of low energy boron ions 1975
14 3 p. 286-
1 p.
artikel
226 Thermally stimulated currents in thin films of silicon monoxide doped with metallic impurities 1975
14 3 p. 280-
1 p.
artikel
227 The systems reliability service and its generic techniques 1975
14 3 p. 261-
1 p.
artikel
228 Thick film hybrid audio amplifier circuits for low noise applications 1975
14 3 p. 283-
1 p.
artikel
229 Thick film hybrid circuits in medical applications 1975
14 3 p. 282-
1 p.
artikel
230 Thick-film hybrids in low-noise audio applications 1975
14 3 p. 282-
1 p.
artikel
231 Thick film techniques for hybrid integrated microwave circuits 1975
14 3 p. 282-
1 p.
artikel
232 Thin film circuit element production 1975
14 3 p. 283-
1 p.
artikel
233 Thin-film circuit processing on dielectric substrates 1975
14 3 p. 281-
1 p.
artikel
234 Thin film evaporation using the hot leading channel method. Part One—Calculation of the distribution of the density of particles falling on the substrate 1975
14 3 p. 282-283
2 p.
artikel
235 Thin film 7 GH z Non-degenerate paramp 1975
14 3 p. 284-
1 p.
artikel
236 Thin film structures with a gap width comparable to the film thickness fabricated by sputter etching 1975
14 3 p. 284-
1 p.
artikel
237 Tie set approach to determine the frequency of system failure Singh, C.
1975
14 3 p. 293-294
2 p.
artikel
238 Time dependent breakdown in silicon dioxide films 1975
14 3 p. 264-
1 p.
artikel
239 Titanium-gold: high-reliability transistor metallisation 1975
14 3 p. 263-
1 p.
artikel
240 Towards a better understanding of screen print thickness control 1975
14 3 p. 284-
1 p.
artikel
241 Ultra-reliable voter switches, with a bibliography of mechanization 1975
14 3 p. 267-
1 p.
artikel
242 University research on microelectronics and on reliability 1975
14 3 p. 249-250
2 p.
artikel
243 Vacuum deposition rate measurements on thin polymer films 1975
14 3 p. 281-
1 p.
artikel
244 Vacuum systems for ion implantation equipment 1975
14 3 p. 286-
1 p.
artikel
                             244 gevonden resultaten
 
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