nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A current pulse screening test for metal step coverage—final report
|
|
|
1975 |
14 |
3 |
p. 263- 1 p. |
artikel |
2 |
Advances in low temperature die bonding techniques
|
|
|
1975 |
14 |
3 |
p. 272- 1 p. |
artikel |
3 |
A few examples of applying laser microspectral analysis in semiconductor engineering
|
|
|
1975 |
14 |
3 |
p. 285- 1 p. |
artikel |
4 |
Ake 13—Software reliability aspects
|
|
|
1975 |
14 |
3 |
p. 270- 1 p. |
artikel |
5 |
A life-test study of electromigration in microwave power transistors
|
|
|
1975 |
14 |
3 |
p. 265- 1 p. |
artikel |
6 |
A low power RC-coupled VHF amplifier designed for fabrication by hybrid microcircuit techniques. Technical memo
|
|
|
1975 |
14 |
3 |
p. 284- 1 p. |
artikel |
7 |
A model for the failure of bipolar silicon integrated circuits subjected to electrostatic discharge
|
|
|
1975 |
14 |
3 |
p. 264- 1 p. |
artikel |
8 |
An accurate computer analysis of relaxation effects in MOS capacitors
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
9 |
An alternative approach to a reliability problem
|
|
|
1975 |
14 |
3 |
p. 268- 1 p. |
artikel |
10 |
Analysis and improvement of a static shift register
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
11 |
Analyzing the interface of reliability and economics of unmanned satellites
|
|
|
1975 |
14 |
3 |
p. 267-268 2 p. |
artikel |
12 |
An application of Markov chains for the evaluation of the operating characteristics of chain sampling inspection plans
|
|
|
1975 |
14 |
3 |
p. 262- 1 p. |
artikel |
13 |
An approach for evaluating Polymer materials as protective coatings on hybrid microcircuits
|
|
|
1975 |
14 |
3 |
p. 284-285 2 p. |
artikel |
14 |
A new approach to reliability prediction
|
|
|
1975 |
14 |
3 |
p. 262- 1 p. |
artikel |
15 |
An integrated circuit two-tone generator
|
|
|
1975 |
14 |
3 |
p. 274-275 2 p. |
artikel |
16 |
An investigation into the use of computer aided design in thick film circuits
|
|
|
1975 |
14 |
3 |
p. 283- 1 p. |
artikel |
17 |
A note on reliability prediction of electronic equipment (MIL-HDBK-217B)
|
Reiche, H. |
|
1975 |
14 |
3 |
p. 252- 1 p. |
artikel |
18 |
A personal view of some reliability activities in the United Kingdom
|
|
|
1975 |
14 |
3 |
p. 261- 1 p. |
artikel |
19 |
Application de la gravure ionique a la microelectronique
|
|
|
1975 |
14 |
3 |
p. 286- 1 p. |
artikel |
20 |
A program system for safeguarding the availability of the Siemens system EDS
|
|
|
1975 |
14 |
3 |
p. 269- 1 p. |
artikel |
21 |
Arinc research corporation five-day courses reliability and maintainability techniques
|
|
|
1975 |
14 |
3 |
p. 259- 1 p. |
artikel |
22 |
As clipper, IC comparator is improved by feedback
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
23 |
A self-consistent calculation of effective intrinsic concentration in heavily-doped silicon
|
|
|
1975 |
14 |
3 |
p. 280- 1 p. |
artikel |
24 |
A special type of reliable circuit
|
|
|
1975 |
14 |
3 |
p. 267- 1 p. |
artikel |
25 |
A stable delay multivibrator using a linear IC chip
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
26 |
A systems approach to the design of MOS memory components
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
27 |
A thin-film/semiconductor thermocouple for microwave power measurements
|
|
|
1975 |
14 |
3 |
p. 282- 1 p. |
artikel |
28 |
A treatment of impurity diffusion in oxidizing ambients
|
|
|
1975 |
14 |
3 |
p. 280-281 2 p. |
artikel |
29 |
A UHF thick film tuner
|
|
|
1975 |
14 |
3 |
p. 283- 1 p. |
artikel |
30 |
Automating the epitaxial process
|
|
|
1975 |
14 |
3 |
p. 271- 1 p. |
artikel |
31 |
Automation applied to repair and maintenance of electronic systems
|
|
|
1975 |
14 |
3 |
p. 269- 1 p. |
artikel |
32 |
Availibility as a criterion of system performance
|
|
|
1975 |
14 |
3 |
p. 269-270 2 p. |
artikel |
33 |
Avalanche-injected electron currents in SiO2 at high injection densities
|
|
|
1975 |
14 |
3 |
p. 279- 1 p. |
artikel |
34 |
Bayes estimation in life testing and reliability: a multivariate case
|
|
|
1975 |
14 |
3 |
p. 267- 1 p. |
artikel |
35 |
Better Bipolar-MOS process yields linear ICs with good ac and dc specs
|
|
|
1975 |
14 |
3 |
p. 271- 1 p. |
artikel |
36 |
Bipolar LSI computing elements usher in new era of digital design
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
37 |
Bipolar memories
|
|
|
1975 |
14 |
3 |
p. 276- 1 p. |
artikel |
38 |
Bi-polar technology. A re-evaluation
|
|
|
1975 |
14 |
3 |
p. 277- 1 p. |
artikel |
39 |
Bi-polar technology. Integrated injection logic—present and future
|
|
|
1975 |
14 |
3 |
p. 276- 1 p. |
artikel |
40 |
Calendar of international conferences, symposia, lectures and meetings of interest
|
|
|
1975 |
14 |
3 |
p. 251-252 2 p. |
artikel |
41 |
Characterisation of silicon metallization systems using energetic ion backscattering
|
|
|
1975 |
14 |
3 |
p. 278- 1 p. |
artikel |
42 |
Characterization of a chromium-gold deposition process for the production of thin film hybrid microcircuits
|
|
|
1975 |
14 |
3 |
p. 284- 1 p. |
artikel |
43 |
Charge-transfer devices filter complex communications signals
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
44 |
C-MOS—a status report
|
|
|
1975 |
14 |
3 |
p. 276- 1 p. |
artikel |
45 |
C-MOS specifications: Don't take them for granted
|
|
|
1975 |
14 |
3 |
p. 270- 1 p. |
artikel |
46 |
Comparative advantages of in-house custom design of MOS LSI
|
|
|
1975 |
14 |
3 |
p. 271- 1 p. |
artikel |
47 |
Comparison of the structure of amorphous Ge and GaAs
|
|
|
1975 |
14 |
3 |
p. 280- 1 p. |
artikel |
48 |
Compliant beam lead bonding
|
|
|
1975 |
14 |
3 |
p. 271-272 2 p. |
artikel |
49 |
Component reliability under environmental stress
|
|
|
1975 |
14 |
3 |
p. 266- 1 p. |
artikel |
50 |
Component reliability under nuclear radiation environment
|
|
|
1975 |
14 |
3 |
p. 263- 1 p. |
artikel |
51 |
Computer-aided sequential testing for equipment reliability
|
|
|
1975 |
14 |
3 |
p. 268- 1 p. |
artikel |
52 |
Computer controlled electron-beam projection mask aligner
|
|
|
1975 |
14 |
3 |
p. 285- 1 p. |
artikel |
53 |
Conduction mechanisms in thick film microcircuits. Semiannual technical report
|
|
|
1975 |
14 |
3 |
p. 285- 1 p. |
artikel |
54 |
Control of electrostatic discharge damage to semiconductors
|
|
|
1975 |
14 |
3 |
p. 265- 1 p. |
artikel |
55 |
Critical parameters in glass sealed ceramic packages
|
|
|
1975 |
14 |
3 |
p. 282- 1 p. |
artikel |
56 |
Current-voltage characteristics, dielectric breakdown and potential distribution measurements in Au-SiOx-Au thin film diodes and triodes
|
|
|
1975 |
14 |
3 |
p. 282- 1 p. |
artikel |
57 |
Decision theoretic approach to the design of reliability systems
|
Singh, N. |
|
1975 |
14 |
3 |
p. 315-318 4 p. |
artikel |
58 |
Defect creation in electronic materials
|
|
|
1975 |
14 |
3 |
p. 263- 1 p. |
artikel |
59 |
Degradation of gold-germanium ohmic contact to n-GaAs
|
|
|
1975 |
14 |
3 |
p. 265- 1 p. |
artikel |
60 |
Degradation of oxide films due to radiation effects in exposure to plasmas in sputter deposition and backsputtering
|
|
|
1975 |
14 |
3 |
p. 278- 1 p. |
artikel |
61 |
Design of polymer resists for electron lithography
|
|
|
1975 |
14 |
3 |
p. 271- 1 p. |
artikel |
62 |
design of systems and circuits for maximum reliability or maximum production Yield
|
|
|
1975 |
14 |
3 |
p. 260- 1 p. |
artikel |
63 |
Design validation for reliable LSI circuits
|
|
|
1975 |
14 |
3 |
p. 266- 1 p. |
artikel |
64 |
Detection by Auger electron spectroscopy and removal by ozonization of photoresist residues
|
|
|
1975 |
14 |
3 |
p. 272- 1 p. |
artikel |
65 |
Determination of the semiconductor doping profile right up to its surface using the MIS capacitor
|
|
|
1975 |
14 |
3 |
p. 281- 1 p. |
artikel |
66 |
Diagnosis of equipment failures by pattern recognition
|
|
|
1975 |
14 |
3 |
p. 268- 1 p. |
artikel |
67 |
Die bond failure modes
|
|
|
1975 |
14 |
3 |
p. 264- 1 p. |
artikel |
68 |
Dielectric thin-film branching waveguide
|
|
|
1975 |
14 |
3 |
p. 282- 1 p. |
artikel |
69 |
Diffusion near an absorbing boundary
|
|
|
1975 |
14 |
3 |
p. 280- 1 p. |
artikel |
70 |
Diverse industry users clamber aboard the micropressor bandwagon
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
71 |
Effect of disorder on direct and indirect band gaps of semiconductor alloys
|
|
|
1975 |
14 |
3 |
p. 277- 1 p. |
artikel |
72 |
Effect of temperature and voltage sweep rate on C-V characteristics of MIS capacitors
|
|
|
1975 |
14 |
3 |
p. 273- 1 p. |
artikel |
73 |
Electrical characterization of complex microcircuits. Final technical report
|
|
|
1975 |
14 |
3 |
p. 270- 1 p. |
artikel |
74 |
Electromigration failure in Al thin films under constant and reversed d.c. powering
|
|
|
1975 |
14 |
3 |
p. 262-263 2 p. |
artikel |
75 |
Electron bombarded semiconductor devices
|
|
|
1975 |
14 |
3 |
p. 285- 1 p. |
artikel |
76 |
Electron irradiation damage in silicon containing carbon and diffused 18O
|
|
|
1975 |
14 |
3 |
p. 285- 1 p. |
artikel |
77 |
Erratum
|
|
|
1975 |
14 |
3 |
p. 319- 1 p. |
artikel |
78 |
Establishment of reliability data for power plant components by means of an information system
|
|
|
1975 |
14 |
3 |
p. 268- 1 p. |
artikel |
79 |
Extreme value characteristics of distributions of cumulative processes
|
|
|
1975 |
14 |
3 |
p. 261- 1 p. |
artikel |
80 |
Fabrication techniques for surface-acoustic-wave and thin-film optical devices
|
|
|
1975 |
14 |
3 |
p. 272- 1 p. |
artikel |
81 |
Failure analysis of AUTODIN microelectronics, technical rept.
|
|
|
1975 |
14 |
3 |
p. 265- 1 p. |
artikel |
82 |
Failure mechanisms in gold and aluminum microwave power transistors
|
|
|
1975 |
14 |
3 |
p. 264-265 2 p. |
artikel |
83 |
Failure mode effects and criticality analysis (FMECA) and planned maintenance applied to TXE 4 electronic switching system
|
|
|
1975 |
14 |
3 |
p. 270- 1 p. |
artikel |
84 |
Fault clearance in the periphery of stored-program controlled telephone switching systems with the aid of a central service computer (SC)
|
|
|
1975 |
14 |
3 |
p. 269- 1 p. |
artikel |
85 |
FCL: key partner in integrated-circuit design
|
|
|
1975 |
14 |
3 |
p. 271- 1 p. |
artikel |
86 |
Field-enhanced carrier generation in MOS capacitors
|
|
|
1975 |
14 |
3 |
p. 273- 1 p. |
artikel |
87 |
For solid-state watches the time is at hand
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
88 |
Frequency dependence of ΔV/Δ (C−2 ) of MOS capacitors
|
|
|
1975 |
14 |
3 |
p. 273- 1 p. |
artikel |
89 |
Fundamental physical limitations in integrated circuits
|
|
|
1975 |
14 |
3 |
p. 270- 1 p. |
artikel |
90 |
Further studies on thin film structures of metal-borosilicate glass-metal
|
|
|
1975 |
14 |
3 |
p. 282- 1 p. |
artikel |
91 |
Gas and smoke detector uses low-leakage MOS transistor
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
92 |
GEISHA semiconductor reliability studies. A portion of CHAIR-GEISHA—Final Report
|
|
|
1975 |
14 |
3 |
p. 266- 1 p. |
artikel |
93 |
Gold scavenging characteristics of bonding alloys
|
|
|
1975 |
14 |
3 |
p. 281- 1 p. |
artikel |
94 |
High reliability photodiodes for space applications
|
Brilman, M. |
|
1975 |
14 |
3 |
p. 305-306 2 p. |
artikel |
95 |
High resolution Fourier transform spectroscopy of shallow acceptors in ultra-pure germanium
|
|
|
1975 |
14 |
3 |
p. 278- 1 p. |
artikel |
96 |
Hot hole anisotropic effect in silicon and germanium
|
|
|
1975 |
14 |
3 |
p. 278- 1 p. |
artikel |
97 |
Hybrid microcircuit reliability data
|
|
|
1975 |
14 |
3 |
p. 253- 1 p. |
artikel |
98 |
Hybrid passive components—packaging
|
|
|
1975 |
14 |
3 |
p. 284- 1 p. |
artikel |
99 |
IC op amp has C-MOS output
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
100 |
IC voltage regulators
|
|
|
1975 |
14 |
3 |
p. 276- 1 p. |
artikel |
101 |
I2L takes bipolar integration a significant step forward
|
|
|
1975 |
14 |
3 |
p. 273- 1 p. |
artikel |
102 |
Improved conventional photolithography by relief mask processing
|
|
|
1975 |
14 |
3 |
p. 281- 1 p. |
artikel |
103 |
Influence of carriers on the capacitance of p-n junctions with deep donors
|
|
|
1975 |
14 |
3 |
p. 278-279 2 p. |
artikel |
104 |
Integrated temperature transducers
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
105 |
Interfacing a source utilizing low perveance ion beam extraction to a beam transport system suitable for ion implantation
|
|
|
1975 |
14 |
3 |
p. 286- 1 p. |
artikel |
106 |
Ion implantation boosts threshold of JFET breakdown
|
|
|
1975 |
14 |
3 |
p. 285- 1 p. |
artikel |
107 |
Ion-implanted semiconductor devices
|
|
|
1975 |
14 |
3 |
p. 285-286 2 p. |
artikel |
108 |
Ionizable materials to produce ions for implantation
|
|
|
1975 |
14 |
3 |
p. 286- 1 p. |
artikel |
109 |
Large-area uniform evaporated thin films
|
|
|
1975 |
14 |
3 |
p. 283- 1 p. |
artikel |
110 |
Laser trimming of thick film resistors
|
|
|
1975 |
14 |
3 |
p. 285- 1 p. |
artikel |
111 |
LIC technology
|
|
|
1975 |
14 |
3 |
p. 276- 1 p. |
artikel |
112 |
Linear and interface circuits
|
|
|
1975 |
14 |
3 |
p. 276- 1 p. |
artikel |
113 |
Literature survey on structural reliability
|
|
|
1975 |
14 |
3 |
p. 262- 1 p. |
artikel |
114 |
Low firing temperature resistors for use on glass
|
|
|
1975 |
14 |
3 |
p. 283- 1 p. |
artikel |
115 |
Low-speed counter uses low-priced calculator chip
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
116 |
Low voltage dynamic MOS memory
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
117 |
LSI yield projections based upon test pattern results: an application to multilevel metal structures
|
|
|
1975 |
14 |
3 |
p. 272-273 2 p. |
artikel |
118 |
Marketing hybrid integrated circuits
|
|
|
1975 |
14 |
3 |
p. 282- 1 p. |
artikel |
119 |
Median-time-to-failure (MTF) of an L-Band power transistor under RF conditions
|
|
|
1975 |
14 |
3 |
p. 264- 1 p. |
artikel |
120 |
Metallization corrosion in silicon devices by moisture-induced electrolysis
|
|
|
1975 |
14 |
3 |
p. 263-264 2 p. |
artikel |
121 |
Metal-semiconductor contacts prepared by ion implantation
|
|
|
1975 |
14 |
3 |
p. 285- 1 p. |
artikel |
122 |
Method of calculation of the impurity obtained by a multiple diffusion process
|
|
|
1975 |
14 |
3 |
p. 277-278 2 p. |
artikel |
123 |
Method of predicting the reliability during the development of a switching system
|
|
|
1975 |
14 |
3 |
p. 269- 1 p. |
artikel |
124 |
Methods and procedures for computer based handling of components reliability data at FTL (The Swedish Military Electronics Laboratory)
|
|
|
1975 |
14 |
3 |
p. 263- 1 p. |
artikel |
125 |
Microcircuit device malfunction report
|
|
|
1975 |
14 |
3 |
p. 253- 1 p. |
artikel |
126 |
Microprocessor directs wafer-prober
|
|
|
1975 |
14 |
3 |
p. 272- 1 p. |
artikel |
127 |
Microprocessors expand industry applications of data acquisition
|
|
|
1975 |
14 |
3 |
p. 270- 1 p. |
artikel |
128 |
Millimeter-wave integrated circuits
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
129 |
Mixed-discipline monolithic integrated circuits—bipolar, MOS and COS/MOS technologies and future trends
|
|
|
1975 |
14 |
3 |
p. 276- 1 p. |
artikel |
130 |
Model of doped-oxide-source diffusion in silicon
|
|
|
1975 |
14 |
3 |
p. 278- 1 p. |
artikel |
131 |
Moisture in SC packages
|
|
|
1975 |
14 |
3 |
p. 272- 1 p. |
artikel |
132 |
Molecular bonding conductive films
|
|
|
1975 |
14 |
3 |
p. 272- 1 p. |
artikel |
133 |
Monte-Carlo calculation of electron transport in polar semiconductors
|
|
|
1975 |
14 |
3 |
p. 279- 1 p. |
artikel |
134 |
MOS and bipolar ICs in consumer applications
|
|
|
1975 |
14 |
3 |
p. 275-276 2 p. |
artikel |
135 |
MOS in the telephone exchange
|
|
|
1975 |
14 |
3 |
p. 274- 1 p. |
artikel |
136 |
MOS technology—MOS a major factor
|
|
|
1975 |
14 |
3 |
p. 276- 1 p. |
artikel |
137 |
MOS technology. Opening statement
|
|
|
1975 |
14 |
3 |
p. 276-277 2 p. |
artikel |
138 |
N. Channel MOS memories—new possibilities for microprocessor memory design
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
139 |
New alumina substrate for hybrid integrated circuits
|
|
|
1975 |
14 |
3 |
p. 284- 1 p. |
artikel |
140 |
New applications of linear integrated circuits in the entertainment industry
|
|
|
1975 |
14 |
3 |
p. 275- 1 p. |
artikel |
141 |
New move towards electronic parts reliability standards
|
|
|
1975 |
14 |
3 |
p. 262- 1 p. |
artikel |
142 |
Non-ionic room temperature instabilities in MOS devices
|
|
|
1975 |
14 |
3 |
p. 280- 1 p. |
artikel |
143 |
Ohmic hole mobility in cubic semiconductors
|
|
|
1975 |
14 |
3 |
p. 277- 1 p. |
artikel |
144 |
On the software reliability
|
|
|
1975 |
14 |
3 |
p. 268-269 2 p. |
artikel |
145 |
Operational behaviour of a complex system having shelf-life of the components under preemptive resume repair discipline
|
|
|
1975 |
14 |
3 |
p. 264- 1 p. |
artikel |
146 |
Parametric effects in thin film niobium Josephson junctions
|
|
|
1975 |
14 |
3 |
p. 282- 1 p. |
artikel |
147 |
Photosensitive thick film paste
|
|
|
1975 |
14 |
3 |
p. 283- 1 p. |
artikel |
148 |
Physical and thermodynamic properties of semiconductor industry chemical materials
|
|
|
1975 |
14 |
3 |
p. 273- 1 p. |
artikel |
149 |
Plasma etching as applied to failure analysis
|
|
|
1975 |
14 |
3 |
p. 266- 1 p. |
artikel |
150 |
Plasma etching PROMS and other problems
|
|
|
1975 |
14 |
3 |
p. 273- 1 p. |
artikel |
151 |
Prediction of avalanche breakdown voltage in silicon step junctions
|
|
|
1975 |
14 |
3 |
p. 279- 1 p. |
artikel |
152 |
Principal component analysis of production data
|
|
|
1975 |
14 |
3 |
p. 267- 1 p. |
artikel |
153 |
Problems in the analysis of semiconductor device materials exposed to ionizing radiation
|
|
|
1975 |
14 |
3 |
p. 278- 1 p. |
artikel |
154 |
Process III—A new high performance bipolar process
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1975 |
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p. 271- 1 p. |
artikel |
155 |
Programmable surface acoustic wave devices utilizing hybrid microelectronic techniques
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1975 |
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p. 281- 1 p. |
artikel |
156 |
Projection mask alignment—problems and solutions
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1975 |
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p. 273- 1 p. |
artikel |
157 |
Properties of Au, Pt, Pd and Rh levels in silicon measured with a constant capacitance technique
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1975 |
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p. 279- 1 p. |
artikel |
158 |
Quality assurance and the large customer the modern concept
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1975 |
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p. 262- 1 p. |
artikel |
159 |
Radiation effects on semiconductor devices
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1975 |
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p. 270- 1 p. |
artikel |
160 |
Range and standard deviation of ion-implanted phosphorus and boron in silicon
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1975 |
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p. 286- 1 p. |
artikel |
161 |
Recent development in silicon-device technology at “LAMEL”
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1975 |
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p. 270-271 2 p. |
artikel |
162 |
Regulating voltage with just one quad IC and one supply
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1975 |
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p. 274- 1 p. |
artikel |
163 |
Reliabile software for SPC systems
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1975 |
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p. 269- 1 p. |
artikel |
164 |
Reliability achievement in the IBM 3750
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1975 |
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p. 269- 1 p. |
artikel |
165 |
Reliability analysis of a 2-dissimilar units redundant system with Erlang-failure and general repair distributions
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1975 |
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p. 269- 1 p. |
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166 |
Reliability analysis of large repairable systems
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1975 |
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p. 268- 1 p. |
artikel |
167 |
1975 reliability and maintainability symposium
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1975 |
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p. 253-259 7 p. |
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168 |
Reliability assessment of a semiconductor memory by design analysis
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1975 |
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p. 268- 1 p. |
artikel |
169 |
Reliability considerations in the design and fabrication of polysilicon fusable link PROM's
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1975 |
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p. 269- 1 p. |
artikel |
170 |
Reliability design of a maintained system
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1975 |
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p. 268- 1 p. |
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171 |
Reliability efforts in large European programs for military and commercial aircraft development
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1975 |
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p. 266-267 2 p. |
artikel |
172 |
Reliability evaluation of communication systems using flow graphs
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1975 |
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p. 268- 1 p. |
artikel |
173 |
Reliability of nondeteriorating devices
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1975 |
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p. 267- 1 p. |
artikel |
174 |
Reliability of silicon and gallium arsenide K a -bandIMPATT diodes
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1975 |
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p. 266- 1 p. |
artikel |
175 |
Reliability of statically controlled drives
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Kohli, D.R. |
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1975 |
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p. 287-292 6 p. |
artikel |
176 |
Reliability optimization through random search algorithm
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1975 |
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p. 267- 1 p. |
artikel |
177 |
Reliability prediction of silicon bipolar transistors by means of noise measurements
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1975 |
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p. 264- 1 p. |
artikel |
178 |
Reliability studies of Gunn diodes
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1975 |
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p. 264- 1 p. |
artikel |
179 |
Reliability study of an N-channel silicon gate FET with field shield
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1975 |
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p. 265- 1 p. |
artikel |
180 |
Reliability targets—are they valid and can they be specified
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1975 |
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p. 262- 1 p. |
artikel |
181 |
Results of production thermal cycle screening
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1975 |
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p. 266- 1 p. |
artikel |
182 |
Schottky components are byte-sized
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1975 |
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p. 274- 1 p. |
artikel |
183 |
Screenability and Rheology
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1975 |
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p. 284- 1 p. |
artikel |
184 |
Screen: Essential tool for thick film printing
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1975 |
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p. 284- 1 p. |
artikel |
185 |
Scribing and breaking of semiconductor wafers
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1975 |
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p. 272- 1 p. |
artikel |
186 |
See-through masks aid semiconductor device manufacturing
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1975 |
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p. 273- 1 p. |
artikel |
187 |
Semiconductor measurement technology: ARPA/NBS workshop I. Measurement problems in integrated circuit processing and assembly. Special publication
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1975 |
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p. 272- 1 p. |
artikel |
188 |
Semiconductor measurement technology: microelectronic ultrasonic bonding. Special publication
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1975 |
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p. 272- 1 p. |
artikel |
189 |
Sequential life tests
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1975 |
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p. 268- 1 p. |
artikel |
190 |
Signal-flow graphs in reliability theory
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1975 |
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p. 262- 1 p. |
artikel |
191 |
Silicone resins for semiconductor protection
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1975 |
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p. 270- 1 p. |
artikel |
192 |
Simple radiation defects in semiconductors and their temperature transformations
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1975 |
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p. 263- 1 p. |
artikel |
193 |
Simplification method of fault detection making monoterm degeneration compatible with functional completeness
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1975 |
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p. 268- 1 p. |
artikel |
194 |
Single-chip micro processor employs minicomputer word length
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1975 |
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p. 275- 1 p. |
artikel |
195 |
Some applications of regenerative stochastic processes to Reliability Theory—Part 1: Tutorial Introduction
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1975 |
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p. 261-262 2 p. |
artikel |
196 |
Some aspects of damage models
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1975 |
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p. 267- 1 p. |
artikel |
197 |
Some characteristics of ion implanted resistors
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1975 |
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3 |
p. 286- 1 p. |
artikel |
198 |
Some reliability aspects of electron bombarded semiconductor power devices
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1975 |
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3 |
p. 263- 1 p. |
artikel |
199 |
Some reliability characteristics of CRT cathode assemblies
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1975 |
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3 |
p. 264- 1 p. |
artikel |
200 |
Some thoughts on the reliability of telecommunication networks
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1975 |
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p. 269- 1 p. |
artikel |
201 |
Stability and deterioration mechanism of thick film resistors
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1975 |
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p. 281- 1 p. |
artikel |
202 |
State of reliability effort in Europe
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1975 |
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p. 261- 1 p. |
artikel |
203 |
Static electrificatio hazards in microelectronics production
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1975 |
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p. 270- 1 p. |
artikel |
204 |
Stationary room temperature MOS-C deep-depletion characteristics
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1975 |
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p. 280- 1 p. |
artikel |
205 |
Step-stress failure rate models for electronic components
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1975 |
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p. 263- 1 p. |
artikel |
206 |
Stochastic behaviour of a two-unit priority standby redundant system with repair
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Nakagawa, Toshio |
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1975 |
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p. 309-313 5 p. |
artikel |
207 |
Surface breakdown in silicon planar junctions—a computer-aided experimental determination of the critical field
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1975 |
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p. 279- 1 p. |
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208 |
Surface states in the conduction band region of Si
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1975 |
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p. 280- 1 p. |
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209 |
Surface-state spectra from thick-oxide MOS tunnel junctions
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1975 |
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p. 279- 1 p. |
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210 |
Susceptibility of semiconductor devices to thermal second breakdown
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1975 |
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p. 265- 1 p. |
artikel |
211 |
Technology teamwork—MOS and bipolar
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1975 |
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p. 275- 1 p. |
artikel |
212 |
The accelerated testing of plastic encapsulated semiconductor components
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1975 |
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p. 265- 1 p. |
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213 |
The advantages of thin film hybrids in instruments
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1975 |
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p. 282- 1 p. |
artikel |
214 |
The application of reliability and mainatainability techniques
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1975 |
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p. 259-260 2 p. |
artikel |
215 |
The case for component burn-in: the gain is well worth the price
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1975 |
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p. 266- 1 p. |
artikel |
216 |
The comparison of RF sputtering systems
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1975 |
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p. 281- 1 p. |
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217 |
The confusion in the quality field
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1975 |
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p. 262- 1 p. |
artikel |
218 |
The corrosive activity of fluxes
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Bochenek, Andrzej |
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1975 |
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p. 295-303 9 p. |
artikel |
219 |
The evaluation of radiation damaged epitaxial silicon
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1975 |
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p. 279-280 2 p. |
artikel |
220 |
The Ferranti CDI process and its achievements
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1975 |
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p. 271- 1 p. |
artikel |
221 |
The gate-controlled diode so measurement and steady-state lateral current flow in deeply depleted MOS structures
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1975 |
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p. 277- 1 p. |
artikel |
222 |
The impact of technological change in the semiconductor industry
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1975 |
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p. 277- 1 p. |
artikel |
223 |
The long-term reliability of plastics encapsulated microelectronic devices—corrosion and the role of adhesion
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1975 |
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p. 262- 1 p. |
artikel |
224 |
Thermal characteristics of ICs gain in importance
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1975 |
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p. 273- 1 p. |
artikel |
225 |
Thermally stimulated current measurements on silicon junctions produced by implantation of low energy boron ions
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1975 |
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p. 286- 1 p. |
artikel |
226 |
Thermally stimulated currents in thin films of silicon monoxide doped with metallic impurities
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1975 |
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p. 280- 1 p. |
artikel |
227 |
The systems reliability service and its generic techniques
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1975 |
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p. 261- 1 p. |
artikel |
228 |
Thick film hybrid audio amplifier circuits for low noise applications
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1975 |
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p. 283- 1 p. |
artikel |
229 |
Thick film hybrid circuits in medical applications
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1975 |
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p. 282- 1 p. |
artikel |
230 |
Thick-film hybrids in low-noise audio applications
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1975 |
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p. 282- 1 p. |
artikel |
231 |
Thick film techniques for hybrid integrated microwave circuits
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1975 |
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p. 282- 1 p. |
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232 |
Thin film circuit element production
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1975 |
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p. 283- 1 p. |
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233 |
Thin-film circuit processing on dielectric substrates
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1975 |
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p. 281- 1 p. |
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234 |
Thin film evaporation using the hot leading channel method. Part One—Calculation of the distribution of the density of particles falling on the substrate
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1975 |
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p. 282-283 2 p. |
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235 |
Thin film 7 GH z Non-degenerate paramp
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1975 |
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p. 284- 1 p. |
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236 |
Thin film structures with a gap width comparable to the film thickness fabricated by sputter etching
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1975 |
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p. 284- 1 p. |
artikel |
237 |
Tie set approach to determine the frequency of system failure
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Singh, C. |
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1975 |
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p. 293-294 2 p. |
artikel |
238 |
Time dependent breakdown in silicon dioxide films
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1975 |
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p. 264- 1 p. |
artikel |
239 |
Titanium-gold: high-reliability transistor metallisation
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1975 |
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p. 263- 1 p. |
artikel |
240 |
Towards a better understanding of screen print thickness control
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1975 |
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3 |
p. 284- 1 p. |
artikel |
241 |
Ultra-reliable voter switches, with a bibliography of mechanization
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1975 |
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3 |
p. 267- 1 p. |
artikel |
242 |
University research on microelectronics and on reliability
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1975 |
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3 |
p. 249-250 2 p. |
artikel |
243 |
Vacuum deposition rate measurements on thin polymer films
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1975 |
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3 |
p. 281- 1 p. |
artikel |
244 |
Vacuum systems for ion implantation equipment
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1975 |
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3 |
p. 286- 1 p. |
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