nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A comparison between the interface properties of N2O-nitrided and N2O-grown oxides
|
Xu, J.P |
|
1998 |
42 |
11 |
p. 2053-2056 4 p. |
artikel |
2 |
Analysis of the FP–JTE planar junction termination
|
Wu, Z.L |
|
1998 |
42 |
11 |
p. 2097-2100 4 p. |
artikel |
3 |
Analytical model for C–V characteristics and transient response of submicrometer non-self-aligned GaAs MESFET
|
Chhokra, Sunita A. |
|
1998 |
42 |
11 |
p. 1917-1924 8 p. |
artikel |
4 |
Analytical model for the threshold voltage of Accumulation Channel MOS-Gate devices
|
Thapar, Naresh |
|
1998 |
42 |
11 |
p. 1975-1979 5 p. |
artikel |
5 |
A new charge pumping model considering bulk trap states in polysilicon thin film transistor
|
Kim, Kee-Jong |
|
1998 |
42 |
11 |
p. 1897-1903 7 p. |
artikel |
6 |
A new self-aligned and T-shaped gate technology for GaAs power MESFETs
|
Lee, Jong-Lam |
|
1998 |
42 |
11 |
p. 2063-2068 6 p. |
artikel |
7 |
A new set of initial conditions for fast and accurate calculation of base transit time and collector current density in bipolar transistors
|
Ma, Pingxi |
|
1998 |
42 |
11 |
p. 2023-2026 4 p. |
artikel |
8 |
A study of the DRAM process simplification by using blanket memory cell source/drain implantation
|
Juang, M.H |
|
1998 |
42 |
11 |
p. 2047-2051 5 p. |
artikel |
9 |
Beryllium doped InP/InGaAsP heterojunction bipolar transistors
|
Shamir, N |
|
1998 |
42 |
11 |
p. 2039-2045 7 p. |
artikel |
10 |
CO-implantation of Si and Be in SI GaAs for improved device performance
|
Dutt, M.B. |
|
1998 |
42 |
11 |
p. 1905-1910 6 p. |
artikel |
11 |
Delay time analysis of AlGaAs/In x Ga1−x As (0.15≤×≤0.45) pseudomorphic HJFETs with InGaAs channel grown under suppressed In-surface segregation conditions
|
Niwa, Takaki |
|
1998 |
42 |
11 |
p. 1911-1916 6 p. |
artikel |
12 |
Dispersive decay of positive oxide charge after high-field stress
|
Wu, Yongjun |
|
1998 |
42 |
11 |
p. 1993-1996 4 p. |
artikel |
13 |
Effect of deposition condition on wet and dry etch rates of device quality inductively coupled plasma-chemically vapor deposited SiN x
|
Hahn, Y.B |
|
1998 |
42 |
11 |
p. 2017-2021 5 p. |
artikel |
14 |
Effects of inversion layer quantization on channel profile engineering for nMOSFETs with 0.1 μm channel lengths
|
Saha, Samar |
|
1998 |
42 |
11 |
p. 1985-1991 7 p. |
artikel |
15 |
Electron injection effect on formation and decomposition of C–H complexes in C-doped GaAs Base of H+-implanted InGaP/GaAs HBTs
|
Kawano, Akihiro |
|
1998 |
42 |
11 |
p. 2057-2061 5 p. |
artikel |
16 |
Energy bandgap of Al x Ga1−x As1−y Sb y and conduction band discontinuity of AlxGa1−xAs1−ySby/InAs and AlxGa1−xAs1−ySby/InGaAs heterostructures
|
Anwar, A.F.M |
|
1998 |
42 |
11 |
p. 2101-2104 4 p. |
artikel |
17 |
ESD protection for slew-rate-controlled output buffer in a 0.5 μm CMOS SRAM technology
|
Ker, Ming-Dou |
|
1998 |
42 |
11 |
p. 2005-2016 12 p. |
artikel |
18 |
Formation of NiSi-silicided shallow p+n junctions by BF2 + implantation into thin Ni or NiSi Films on Si substrates and subsequent anneal
|
Juang, M.H |
|
1998 |
42 |
11 |
p. 1953-1958 6 p. |
artikel |
19 |
Fowler–Nordheim tunneling in MOS capacitors with Si-implanted SiO2
|
Kameda, Etsumasa |
|
1998 |
42 |
11 |
p. 2105-2111 7 p. |
artikel |
20 |
Geometrical parameters and lateral channel doping profile extraction in a vertical IGBT by C–V measurements
|
Kim, Jongoh |
|
1998 |
42 |
11 |
p. 2113-2116 4 p. |
artikel |
21 |
High frequency noise of MOSFETs. II. Experiments
|
Chen, C.H. |
|
1998 |
42 |
11 |
p. 2083-2092 10 p. |
artikel |
22 |
High frequency noise of MOSFETs I Modeling
|
Chen, C.H. |
|
1998 |
42 |
11 |
p. 2069-2081 13 p. |
artikel |
23 |
Inductively coupled plasma etchingof in-based compound semiconductorsin CH4/H2/Ar
|
Diniz, J.A |
|
1998 |
42 |
11 |
p. 1947-1951 5 p. |
artikel |
24 |
Monte Carlo study of Si–n-MOSFETs including the quantization of carriers
|
Ohkura, Yasuyuki |
|
1998 |
42 |
11 |
p. 1997-2004 8 p. |
artikel |
25 |
Non-radiative current in InGaAs/AlGaAs laser diodes as a measure of facet stability
|
Beister, G. |
|
1998 |
42 |
11 |
p. 1939-1945 7 p. |
artikel |
26 |
Reliability performance for InGaAsP/InP laser diodes mounted on different sizes of heat blocks in TO packages
|
Yoon, Hyun-Jae |
|
1998 |
42 |
11 |
p. 1969-1974 6 p. |
artikel |
27 |
Signal quality in digitally modulated scaled laser diodes
|
Thiyagarajan, S.M.K |
|
1998 |
42 |
11 |
p. 2027-2030 4 p. |
artikel |
28 |
Studies of the origin of the yellow luminescence band, the nature of nonradiative recombination and the origin of persistent photoconductivity in n-GaN films
|
Polyakov, A.Y |
|
1998 |
42 |
11 |
p. 1959-1967 9 p. |
artikel |
29 |
Study and application of reactive ion etching on GaInP/InGaAs/GaInP quantum-well HEMTs
|
Kuo, C.W |
|
1998 |
42 |
11 |
p. 1933-1937 5 p. |
artikel |
30 |
Study of lateral polysilicon PN diodes C–V characteristics: Modeling and experiments
|
Amrani, M |
|
1998 |
42 |
11 |
p. 1925-1931 7 p. |
artikel |
31 |
Temperature and frequency dependence of the capacitance of heavily irradiated silicon diodes
|
Borchi, E. |
|
1998 |
42 |
11 |
p. 2093-2096 4 p. |
artikel |
32 |
The effects of interlayer dielectric deposition and processing on the reliability of n-channel transistors
|
Trabzon, L |
|
1998 |
42 |
11 |
p. 2031-2037 7 p. |
artikel |
33 |
Transient response of gallium arsenide and silicon solar cells under laser pulse
|
Jain, Raj K |
|
1998 |
42 |
11 |
p. 1981-1983 3 p. |
artikel |