| no |
title |
author |
magazine |
year |
volume |
issue |
page(s) |
type |
| 1 |
A long wavelength avalanche photodetector for optical communications
|
Chakrabarti, P.
|
|
1989
|
32 |
7 |
p. 521-524
4 p.
|
article
|
| 2 |
An approximate solution of Poisson's equation for semiconductor device modeling
|
De, S.S.
|
|
1989
|
32 |
7 |
p. 517-519
3 p.
|
article
|
| 3 |
A theoretical derivation of the log-normal distribution of time-dependent dielectric breakdown in thin oxides
|
Yaw, Yuh
|
|
1989
|
32 |
7 |
p. 541-546
6 p.
|
article
|
| 4 |
Correction for errors in the profile of a uniformly doped semiconductor due to voltage-independent shunt capacitance
|
Blenner, Herbert D.
|
|
1989
|
32 |
7 |
p. 591-
1 p.
|
article
|
| 5 |
C-V curves for an amorphous/crystalline silicon heterojunction: Calculations at the static limit
|
Rubinelli, F.
|
|
1989
|
32 |
7 |
p. 547-554
8 p.
|
article
|
| 6 |
Editorial — Software survey section
|
|
|
1989
|
32 |
7 |
p. III-V
nvt p.
|
article
|
| 7 |
Equivalent circuits for recombination-generation processes in semiconductors: A unified approach
|
Landsberg, P.T.
|
|
1989
|
32 |
7 |
p. 525-534
10 p.
|
article
|
| 8 |
Erratum
|
|
|
1989
|
32 |
7 |
p. I-
1 p.
|
article
|
| 9 |
Low current 1-D model for SOI structures—Numerical analysis by a fixed function integration method (fixfun)
|
Van de Wiele, F.
|
|
1989
|
32 |
7 |
p. 567-576
10 p.
|
article
|
| 10 |
780 nm GaAlAs distributed feedback lasers
|
Takigawa, Shinichi
|
|
1989
|
32 |
7 |
p. 577-581
5 p.
|
article
|
| 11 |
On the theory of carrier number fluctuations in MOS devices
|
Ghibaudo, Gerard
|
|
1989
|
32 |
7 |
p. 563-565
3 p.
|
article
|
| 12 |
Plasma processing effects on O2-HCl grown Si-SiO2 structures
|
Kassabov, J.
|
|
1989
|
32 |
7 |
p. 535-540
6 p.
|
article
|
| 13 |
Special issue on material and process characterization for semiconductor device simulation
|
|
|
1989
|
32 |
7 |
p. i-
1 p.
|
article
|
| 14 |
Theory of conduction in weakly inverted MOSFETs: A new model for the conductance of an inhomogeneous channel
|
Rawlings, K.J.
|
|
1989
|
32 |
7 |
p. 555-562
8 p.
|
article
|
| 15 |
Two- and three-dimensional process simulator, DOAP, with a new interfacial flux model
|
Ushio, Shintaro
|
|
1989
|
32 |
7 |
p. 583-589
7 p.
|
article
|
Journal description