nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Analytical solutions for threshold voltage calculations in ion-implanted IGFETs
|
Shenai, K. |
|
1983 |
26 |
8 |
p. 761-766 6 p. |
artikel |
2 |
An efficient numerical scheme for spreading resistance calculations based on the variational method
|
Choo, S.C. |
|
1983 |
26 |
8 |
p. 723-730 8 p. |
artikel |
3 |
Blocking capability of planar devices with field limiting rings
|
Brieger, K.-P. |
|
1983 |
26 |
8 |
p. 739-745 7 p. |
artikel |
4 |
Damaged-induced isolation in n-type InP by light-ion implantation
|
Thompson, P.E. |
|
1983 |
26 |
8 |
p. 805-810 6 p. |
artikel |
5 |
Diffusion of zinc into ion implanted iron doped indium phosphide
|
Favennec, P.N. |
|
1983 |
26 |
8 |
p. 771-775 5 p. |
artikel |
6 |
Effect of the velocity-field peak on I–V characteristics of GaAs FET's
|
Chaudhuri, S. |
|
1983 |
26 |
8 |
p. 811-814 4 p. |
artikel |
7 |
Formation of nickel and palladium silicides by a short-pulse light-flash and its application in the metallization of solar cells
|
Lue, Juh Tzeng |
|
1983 |
26 |
8 |
p. 787-793 7 p. |
artikel |
8 |
Gate current flow in cylindrical thyristors with partially shorted cathodes—two and three terminal operation with inner and outer gate configuration—turn-on area
|
Fulop, W. |
|
1983 |
26 |
8 |
p. 777-784 8 p. |
artikel |
9 |
High-frequency admittance of high-electron-mobility transistors (HEMTs)
|
van der Ziel, A. |
|
1983 |
26 |
8 |
p. 753-754 2 p. |
artikel |
10 |
Interpretation of a non-conventional reverse-current curve of a depletion-type gate-controlled diode
|
Swart, Jacobus W. |
|
1983 |
26 |
8 |
p. 801-803 3 p. |
artikel |
11 |
Low-intensity differential photocapacitance of MOS structures
|
Mohan Chandra, M. |
|
1983 |
26 |
8 |
p. 731-737 7 p. |
artikel |
12 |
Noise measurements in ion implanted mosfets
|
Park, H.S. |
|
1983 |
26 |
8 |
p. 747-751 5 p. |
artikel |
13 |
On electrical transport in non-isothermal semi-conductors
|
Dorkel, J.M. |
|
1983 |
26 |
8 |
p. 819-821 3 p. |
artikel |
14 |
Photovoltaic properties of sputtered n-CdO films on p-Cu2O
|
Papadimitriou, L. |
|
1983 |
26 |
8 |
p. 767-769 3 p. |
artikel |
15 |
Planar, ion-implanted bipolar devices in GaAs
|
Vaidyanathan, K.V. |
|
1983 |
26 |
8 |
p. 717-721 5 p. |
artikel |
16 |
Properties of metal semiconductor contacts—I voltage-current characteristics of contacts on intrinsic semiconductors
|
Manifacier, J.-C. |
|
1983 |
26 |
8 |
p. 795-799 5 p. |
artikel |
17 |
Rapid interface parameterization using a single MOS conductance curve
|
Brews, J.R. |
|
1983 |
26 |
8 |
p. 711-716 6 p. |
artikel |
18 |
Schottky barriers on single-crystal indium telluride
|
Sen, S. |
|
1983 |
26 |
8 |
p. 757-759 3 p. |
artikel |
19 |
Simple formulas for analysis of C-V characteristics of MIS capacitor
|
Jakubowski, Andrzej |
|
1983 |
26 |
8 |
p. 755-756 2 p. |
artikel |
20 |
Solid-St. Electron.
|
|
|
1983 |
26 |
8 |
p. 823- 1 p. |
artikel |
21 |
Solubility of GaAs in AuGe eutectic melts
|
Stanchina, William E. |
|
1983 |
26 |
8 |
p. 817-819 3 p. |
artikel |
22 |
Time degradation of metal/CdF2 schottky diodes
|
Singh, A. |
|
1983 |
26 |
8 |
p. 815-817 3 p. |
artikel |