nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Above-ambient temperature control using a thermoelectric heat pump
|
Goldsmid, H.J. |
|
1983 |
26 |
4 |
p. 365-366 2 p. |
artikel |
2 |
Analysis of a non-uniformly doped MPN silicon Schottky barrier solar cell
|
Roy, S.B. |
|
1983 |
26 |
4 |
p. 353-359 7 p. |
artikel |
3 |
Anomalous behaviour in pulsed MOS capacitors and gated diodes due to localised defects
|
Rabbani, K.S. |
|
1983 |
26 |
4 |
p. 366-368 3 p. |
artikel |
4 |
A small geometry MOSFET model for CAD applications
|
Guebels, P.P. |
|
1983 |
26 |
4 |
p. 267-273 7 p. |
artikel |
5 |
Capless annealing of silicon implanted gallium arsenide
|
Grange, J.D. |
|
1983 |
26 |
4 |
p. 313-317 5 p. |
artikel |
6 |
Delay times in Si MOSFETS in the 4.2–400 K temperature range
|
Kamgar, Avid |
|
1983 |
26 |
4 |
p. 291-294 4 p. |
artikel |
7 |
Effect of high field stresses on interface states of n-MOS capacitors
|
Jourdain, M. |
|
1983 |
26 |
4 |
p. 251-257 7 p. |
artikel |
8 |
Erratum
|
|
|
1983 |
26 |
4 |
p. 369- 1 p. |
artikel |
9 |
Noise in two-port devices with a negative input or output conductance
|
Van der ziel, A. |
|
1983 |
26 |
4 |
p. 333-334 2 p. |
artikel |
10 |
Numerical modeling of power mosfets
|
Navon, D.H. |
|
1983 |
26 |
4 |
p. 287-290 4 p. |
artikel |
11 |
On threshold and flat-band voltages for MOS devices with polysilicon gate and nonuniformly doped substrate
|
Marshak, Alan H. |
|
1983 |
26 |
4 |
p. 361-364 4 p. |
artikel |
12 |
Poly I2L with deposited polysilicon collector
|
Elsaid, Mohamed H. |
|
1983 |
26 |
4 |
p. 281-286 6 p. |
artikel |
13 |
Properties of the contact on ion cleaned n and p type silicon surfaces
|
Vieujot-Testemale, E. |
|
1983 |
26 |
4 |
p. 325-331 7 p. |
artikel |
14 |
Radiation effects on thin-oxide MOS capacitors caused by electron beam evaporation of aluminum
|
Hamasaki, M. |
|
1983 |
26 |
4 |
p. 299-303 5 p. |
artikel |
15 |
Replacing the depletion approximation
|
Warner Jr., R.M. |
|
1983 |
26 |
4 |
p. 335-342 8 p. |
artikel |
16 |
Schottky rectifiers on silicon using high barriers
|
Stolt, L. |
|
1983 |
26 |
4 |
p. 295-297 3 p. |
artikel |
17 |
SiSiO2 interface states based on optically activated conductance technique
|
Singh, R.J. |
|
1983 |
26 |
4 |
p. 319-323 5 p. |
artikel |
18 |
The characteristics of AuGe-based ohmic contacts to n-GaAs including the effects of aging
|
Marlow, Gregory S. |
|
1983 |
26 |
4 |
p. 259-266 8 p. |
artikel |
19 |
The complete doping profile using MOS CV technique
|
Lin, Shi-Tron |
|
1983 |
26 |
4 |
p. 343-351 9 p. |
artikel |
20 |
The ƒT Characteristics of epitaxial NPN Transistors in upward operation
|
Kwan, K.W. |
|
1983 |
26 |
4 |
p. 305-312 8 p. |
artikel |
21 |
Two-dimensional numerical simulation of bipolar semiconductor devices taking into account heavy doping effects and Fermi statistics
|
Polsky, B.S. |
|
1983 |
26 |
4 |
p. 275-279 5 p. |
artikel |