nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
An electron imaging system for the fabrication of integrated circuits
|
O'Keeffe, T.W. |
|
1969 |
12 |
11 |
p. 841-844 4 p. |
artikel |
2 |
Über das verhalten von kohlenstoff beim zonenziehen von silicium
|
Haas, E. |
|
1969 |
12 |
11 |
p. 915-918 4 p. |
artikel |
3 |
Characterization of burst noise in silicon devices
|
Hsu, S.T. |
|
1969 |
12 |
11 |
p. 867-878 12 p. |
artikel |
4 |
Determination of deep centers in silicon by thermally stimulated conductivity measurements
|
Schade, H. |
|
1969 |
12 |
11 |
p. 857-860 4 p. |
artikel |
5 |
Device modeling for computer-aided design and analysis of integrated circuits
|
Lindholm, Fred A. |
|
1969 |
12 |
11 |
p. 831-840 10 p. |
artikel |
6 |
Factors affecting the photoemission from caesium oxide covered GaAs
|
Garbe, S. |
|
1969 |
12 |
11 |
p. 893-901 9 p. |
artikel |
7 |
Generation-recombination noise in double-injection diodes
|
Bilger, H.R. |
|
1969 |
12 |
11 |
p. 849-856 8 p. |
artikel |
8 |
Geometrical dependences of the low-frequency generation-recombination noise in mos transistors
|
Yau, L.D. |
|
1969 |
12 |
11 |
p. 903-905 3 p. |
artikel |
9 |
Improvement in the detection of oxygen in silicon by infra-red absorption
|
Pajot, Bernard |
|
1969 |
12 |
11 |
p. 923-925 3 p. |
artikel |
10 |
Messung des übergangswiderstandes zwischen metall und diffusionsschicht in Si-planarelementen
|
Murrmann, H. |
|
1969 |
12 |
11 |
p. 879-886 8 p. |
artikel |
11 |
Noise in junction- and MOS-FET's at high temperatures
|
van der Ziel, A. |
|
1969 |
12 |
11 |
p. 861-866 6 p. |
artikel |
12 |
Non-thermal noise in MOS FET's and MOS tetrodes
|
Takagi, K. |
|
1969 |
12 |
11 |
p. 907-913 7 p. |
artikel |
13 |
On the transport characteristics of a p-n junction with narrow diffused region
|
Gangadhar, R.B. |
|
1969 |
12 |
11 |
p. 887-891 5 p. |
artikel |
14 |
Some comments on the paper ‘an opto-electronic cold cathode for cathode-ray tubes’
|
Chisholm, T. |
|
1969 |
12 |
11 |
p. 925-926 2 p. |
artikel |