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Journal description
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Details for article 24 of 28 found articles
| Title: |
Sequential conversion from line defects to atomic clusters in monolayer WS2 |
| Author: |
Ryu, Gyeong Hee Chan, Ren-Jie |
| Appeared in: |
Applied microscopy |
| Paging: | Volume 50 () nr. 1 pages xx |
| Year: |
2020-11-30 |
| Contents: | |
| Publisher: |
Springer Singapore, Singapore |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 24 of 28 found articles
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