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Journal description
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Details for article 37 of 60 found articles
| Title: |
Flexible Evanescent Wave Interference Lithography System for Sub-half-Wavelength Complex Relief Structures Fabrication |
| Author: |
Torii, Yuki Masui, Shuzo Matsumoto, Yuki Suzuki, Kunikazu Michihata, Masaki Takamasu, Kiyoshi Takahashi, Satoru |
| Appeared in: |
Nanomanufacturing and metrology |
| Paging: | Volume 4 () nr. 4 pages 256-270 |
| Year: |
2021-04-20 |
| Contents: | |
| Publisher: |
Springer Nature Singapore, Singapore |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 37 of 60 found articles
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