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Journal description
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Details for article 5 of 8 found articles
| Title: |
RADIATION THERMOMETRY OF SILICON WAFERS IN A DIFFUSION FURNACE WITH ROD-TYPE AND PRISM-TYPE OPTICAL GUIDES |
| Author: |
Watanabe, Tomoji Hirasawa, Shigeki Torii, Takuji Takagaki, Tetsuya |
| Appeared in: |
Experimental heat transfer |
| Paging: | Volume 3 (1990) nr. 4 pages 371-376 |
| Year: |
1990-11-01 |
| Contents: |
This article examines the accuracy of radiation thermometry in measuring the temperature of silicon wafers in a diffusion furnace. This technique uses optical guides to bring thermal radiation from the wafers to the outside of the furnace. The error due to veiling glare of a rod-type optical guide is 40°C and that of a prism-type is 0.5°C at steady state. |
| Publisher: |
Taylor & Francis |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 5 of 8 found articles
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