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| Titel: |
ULTRAPURIFICATION AND RECYCLING OF HYDROFLUORIC ACID ETCHING SOLUTIONS BY REVERSE OSMOSIS: MEMBRANE PERFORMANCE AND MULTICOMPONENT REJECTION |
| Auteur: |
Mukherjee, D. Kulkarni, A. Chawla, A. Gill, William N. |
| Verschenen in: |
Chemical engineering communications |
| Paginering: | Jaargang 130 (1994) nr. 1 pagina's 127-138 |
| Jaar: |
1994 |
| Inhoud: |
Complex multicomponent hydrofluoric acid (HF∥ etching solutions are studied here to determine the degree of ultrapurification that can be achieved by membrane separation. Interactions among the components in the solution and the rates of permeation and rejection of the various components were measured for membranes which have the ability to resist attack by corrosive etching solutions. Because hydrofluoric acid has a low ionization constant, it can be purified by membrane systems. Several commercially available membranes were found to perform satisfactorily, even after exposure for extended periods of time to concentrated HF etching solutions With ternary solutions (HF-fluosilicic acid- water) membranes also can significantly reject fluosilicic acid (FSA), the principal impurity in HF etching solutions, while HF permeates almost 100% through the membrane Furthermore, membranes significantly reject the trace metallic impurities present in HF etching solutions. Thus, ultrapure HF can be generated by recycling, and our method is expected to have potential for commercial development with applications to a variety of industries. |
| Uitgever: |
Taylor & Francis |
| Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
Details van artikel 16 van 16 gevonden artikelen
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