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                                       Details for article 10 of 43 found articles
 
 
  Effect of the sputtering parameters on the physical properties and photocatalytic reactivity of TiO2 thin films prepared by an RF magnetron sputtering deposition method
 
 
Title: Effect of the sputtering parameters on the physical properties and photocatalytic reactivity of TiO2 thin films prepared by an RF magnetron sputtering deposition method
Author: Ebrahimi, Afshin
Kitano, Masaaki
Iyatani, Kazushi
Horiuchi, Yu
Takeuchi, Masato
Matsuoka, Masaya
Anpo, Masakazu
Appeared in: Research on chemical intermediates
Paging: Volume 39 (2012) nr. 4 pages 1593-1602
Year: 2012
Contents:
Publisher: Springer Netherlands, Dordrecht
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 10 of 43 found articles
 
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