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                                       Details for article 22 of 24 found articles
 
 
  Surface corona discharge-induced plasma chemical process-chemical vapor deposition (SPCP-CVD) as a novel method for surface modification of ceramic membranes
 
 
Title: Surface corona discharge-induced plasma chemical process-chemical vapor deposition (SPCP-CVD) as a novel method for surface modification of ceramic membranes
Author: Ida, Jun-Ichi
Matsuyama, Tatsushi
Yamamoto, Hideo
Appeared in: Advanced powder technology
Paging: Volume 11 (2000) nr. 3 pages 9 p.
Year: 2000
Contents:
Publisher: Society of Powder Technology Japan
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 22 of 24 found articles
 
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 Koninklijke Bibliotheek - National Library of the Netherlands