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A study of titanium nitride diffusion barriers between aluminium and silicon by X-ray absorption spectroscopy: the Si, Ti and N results |
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Titel: |
A study of titanium nitride diffusion barriers between aluminium and silicon by X-ray absorption spectroscopy: the Si, Ti and N results |
Auteur: |
Hu, Y. F. Sham, T. K. Zou, Z. Xu, G. Q. Chan, L. Yates, B. W. Bancroft, G. M. |
Verschenen in: |
Journal of synchrotron radiation |
Paginering: |
Jaargang 8 (2001) nr. 2 pagina's 860-862 |
Jaar: |
2001-03-01 |
Inhoud: |
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Uitgever: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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