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Effective escape depth of photoelectrons for hydrocarbon films in total electron yield measurement as C K-edge |
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Titel: |
Effective escape depth of photoelectrons for hydrocarbon films in total electron yield measurement as C K-edge |
Auteur: |
Ohara, H. Yamamoto, Y. Kajikawa, K. Ishii, H. Seki, K. Ouchi, Y. |
Verschenen in: |
Journal of synchrotron radiation |
Paginering: |
Jaargang 6 (1999) nr. 3 pagina's 803-804 |
Jaar: |
1999-05-01 |
Inhoud: |
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Uitgever: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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