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The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF |
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Titel: |
The wave optical whole process design of the soft X-ray interference lithography beamline at SSRF |
Auteur: |
Xue, Chaofan Meng, Xiangyu Wu, Yanqing Wang, Yong Wang, Liansheng Yang, Shumin Zhao, Jun Tai, Renzhong |
Verschenen in: |
Journal of synchrotron radiation |
Paginering: |
Jaargang 25 (2018) nr. 6 pagina's 1869-1876 |
Jaar: |
2018-01-01 |
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Uitgever: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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