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Local strain and defects in silicon wafers due to nanoindentation revealed by full-field X-ray microdiffraction imaging |
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Titel: |
Local strain and defects in silicon wafers due to nanoindentation revealed by full-field X-ray microdiffraction imaging |
Auteur: |
Li, Z. J. Danilewsky, A. N. Helfen, L. Mikulik, P. Haenschke, D. Wittge, J. Allen, D. McNally, P. Baumbach, T. |
Verschenen in: |
Journal of synchrotron radiation |
Paginering: |
Jaargang 22 (2015) nr. 4 pagina's 1083-1090 |
Jaar: |
2015-07-01 |
Inhoud: |
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Uitgever: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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