Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating
Titel:
Fabrication of high-aspect-ratio Fresnel zone plates by e-beam lithography and electroplating
Auteur:
Chen, Y. T. Lo, T. N. Chiu, C. W. Wang, J. Y. Wang, C. L. Liu, C. J. Wu, S. R. Jeng, S. T. Yang, C. C. Shiue, J. Chen, C. H. Hwu, Y. Yin, G. C. Lin, H. M. Je, J. H. Margaritondo, G.
Verschenen in:
Journal of synchrotron radiation
Paginering:
Jaargang 15 (2008) nr. 2 pagina's 170-175
Jaar:
2008-03-01
Inhoud:
Uitgever:
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England