|
Crystallinity estimation of thin silicon-on-insulator layers by means of diffractometry using a highly parallel X-ray microbeam |
|
|
|
Titel: |
Crystallinity estimation of thin silicon-on-insulator layers by means of diffractometry using a highly parallel X-ray microbeam |
Auteur: |
Takeda, Shingo Yokoyama, Kazushi Tsusaka, Yoshiyuki Kagoshima, Yasushi Matsui, Junji Ogura, Atsushi |
Verschenen in: |
Journal of synchrotron radiation |
Paginering: |
Jaargang 13 (2006) nr. 5 pagina's 373-377 |
Jaar: |
2006-09-01 |
Inhoud: |
|
Uitgever: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
|
|
|
|