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Details for article 9 of 40 found articles
| Title: |
Effect of the crystallographic orientation of the surface of single-crystal Si wafers on the endotaxial growth of NiSi2 nanoplates |
| Author: |
Schuitek, Thiago Paulino da Silva Costa, Daniel Pereira Mattoso Filho, Ney Kellermann, Guinther |
| Appeared in: |
Journal of applied crystallography |
| Paging: | Volume 57 () nr. 5 pages 1426-1435 |
| Year: |
2024-00-01 |
| Contents: | |
| Publisher: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 40 found articles
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