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Quantitative analysis of dislocations in 4H-SiC wafers using synchrotron X-ray topography with ultra-high angular resolution |
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Titel: |
Quantitative analysis of dislocations in 4H-SiC wafers using synchrotron X-ray topography with ultra-high angular resolution |
Auteur: |
Peng, Hongyu Chen, Zeyu Liu, Yafei Raghothamachar, Balaji Huang, Xianrong Assoufid, Lahsen Dudley, Michael |
Verschenen in: |
Journal of applied crystallography |
Paginering: |
Jaargang 55 () nr. 3 pagina's 544-550 |
Jaar: |
2022-06-01 |
Inhoud: |
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Uitgever: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
Bronbestand: |
Elektronische Wetenschappelijke Tijdschriften |
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