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Details for article 9 of 52 found articles
| Title: |
Averaging the intensity of many-layered structures for accurate stacking-fault analysis using Rietveld refinement |
| Author: |
Coelho, Alan A. Evans, John S. O. Lewis, James W. |
| Appeared in: |
Journal of applied crystallography |
| Paging: | Volume 49 (2016) nr. 5 pages 1740-1749 |
| Year: |
2016-00-01 |
| Contents: | |
| Publisher: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 9 of 52 found articles
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