|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 14 of 21 found articles
| Title: |
Spatial intensity profile of an X-ray beam reflected from nearly perfect silicon and diffuse scattering measurements |
| Author: |
Entin, I. R. Khrupa, V. I. |
| Appeared in: |
Journal of applied crystallography |
| Paging: | Volume 24 (1991) nr. 4 pages 403-404 |
| Year: |
1991-08-01 |
| Contents: | |
| Publisher: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 14 of 21 found articles
| << previous | next >> |