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Journal description
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Details for article 12 of 24 found articles
| Title: |
Extreme asymmetric X-ray Bragg reflection of semiconductor heterostructures near the edge of total external reflection |
| Author: |
Brühl, H.-G. Baumbach, T. Gottschalch, V. Pietsch, U. Lengeler, B. |
| Appeared in: |
Journal of applied crystallography |
| Paging: | Volume 23 (1990) nr. 4 pages 228-233 |
| Year: |
1990-08-01 |
| Contents: | |
| Publisher: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 24 found articles
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