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Journal description
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Details for article 12 of 15 found articles
| Title: |
Precise relative X-ray measurement of the lattice parameter of silicon crystals with growth striations |
| Author: |
Kuběna, J. Holý, V. |
| Appeared in: |
Journal of applied crystallography |
| Paging: | Volume 21 (1988) nr. 3 pages 245-251 |
| Year: |
1988-06-01 |
| Contents: | |
| Publisher: |
International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 15 found articles
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