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  Accuracy in X-ray rocking-curve analysis as a necessary requirement for revealing vacancies and interstitials in regrown silicon layers amorphized by ion implantation
 
 
Title: Accuracy in X-ray rocking-curve analysis as a necessary requirement for revealing vacancies and interstitials in regrown silicon layers amorphized by ion implantation
Author: Servidori, M.
Cembali, F.
Appeared in: Journal of applied crystallography
Paging: Volume 21 (1988) nr. 2 pages 176-181
Year: 1988-04-01
Contents:
Publisher: International Union of Crystallography, 5 Abbey Square, Chester, Cheshire CH1 2HU, England
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

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