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                                       Details for article 35 of 38 found articles
 
 
  The Effect of Physical Property Parameters of the Insulation Material Inside the Heat Shield on the Growth of Czochralski Silicon Crystal
 
 
Title: The Effect of Physical Property Parameters of the Insulation Material Inside the Heat Shield on the Growth of Czochralski Silicon Crystal
Author: Hu, Rongrong
Lv, Xuekang
Li, Jiacheng
Ali, Salamat
Qi, Jing
Appeared in: SILICON
Paging: Volume 16 () nr. 4 pages 1559-1567
Year: 2023-11-28
Contents:
Publisher: Springer Netherlands, Dordrecht
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 35 of 38 found articles
 
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