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Journal description
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Details for article 19 of 34 found articles
| Title: |
Numerical Investigation on the Effect of Thermal Gate Moving Rate on Directional Solidification Process |
| Author: |
Su, Wenjia Guan, Zhicheng Li, Jiulong Zhang, Zhen Li, Jiaqi |
| Appeared in: |
SILICON |
| Paging: | Volume 15 () nr. 7 pages 3103-3112 |
| Year: |
2022-11-30 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 19 of 34 found articles
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