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Details for article 38 of 40 found articles
| Title: |
Thermodynamic Analysis of Dissolved Oxygen in a Silicon Melt and the Effect of Processing Parameters on the Oxygen Distribution in Single-crystal Silicon During Czochralski Growth |
| Author: |
Li, Tai Zhao, Liang Lv, Guoqiang Ma, Wenhui Zhang, Mengyu Huang, Zhenling Zhao, Liang |
| Appeared in: |
SILICON |
| Paging: | Volume 15 () nr. 2 pages 1049-1062 |
| Year: |
2022-09-03 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 38 of 40 found articles
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