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Journal description
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Details for article 16 of 36 found articles
| Title: |
Impact of Process Variability on Threshold Voltage in Vertically-Stacked Nanosheet TFET |
| Author: |
Yuehui, Han Ru, Han Yuefeng, Gu Liangyou, Feng |
| Appeared in: |
SILICON |
| Paging: | Volume 15 () nr. 10 pages 4529-4537 |
| Year: |
2023-03-04 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 16 of 36 found articles
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