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Details for article 30 of 60 found articles
| Title: |
Influence of trap carriers in SiO2/HfO2 stacked dielectric cylindrical gate tunnel fet |
| Author: |
Anand, I. Vivek Samuel, T. S. Arun Ramakrishnan, V. N. Ram Kumar, K. |
| Appeared in: |
SILICON |
| Paging: | Volume 14 () nr. 9 pages 4589-4600 |
| Year: |
2021-07-09 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 30 of 60 found articles
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