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Details for article 32 of 60 found articles
| Title: |
Impact of Channel Doping Concentration on the Performance Characteristics and the Reliability of Ultra-Thin Double Gate DG-FinFET Compared with Nano-Single Gate FD-SOI-MOSFET by Using TCAD-Silvaco Tool |
| Author: |
Bourahla, N. Hadri, B. Bourahla, A. |
| Appeared in: |
SILICON |
| Paging: | Volume 14 () nr. 7 pages 3477-3491 |
| Year: |
2021-05-01 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 32 of 60 found articles
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