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Details for article 39 of 80 found articles
| Title: |
Improved Drain Current Characteristics of HfO2/SiO2 Dual Material Dual Gate Extension on Drain Side-TFET |
| Author: |
Balaji, B. Srinivasa Rao, K. Girija Sravani, K. B, Kalivaraprasad Bindu Madhav, N. V. Chandrahas, K. Jaswanth, B. |
| Appeared in: |
SILICON |
| Paging: | Volume 14 () nr. 18 pages 12567-12572 |
| Year: |
2022-06-16 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 39 of 80 found articles
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