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Journal description
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Details for article 18 of 80 found articles
| Title: |
Design and Optimization of Dual Material Gate Junctionless FinFET Using Dimensional Effect, Gate Oxide and Workfunction Engineering at 7 nm Technology Node |
| Author: |
Kusuma, Rambabu Talari, V. K. Hanumantha Rao |
| Appeared in: |
SILICON |
| Paging: | Volume 14 () nr. 16 pages 10301-10311 |
| Year: |
2022-03-01 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 18 of 80 found articles
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