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  Improvising the Switching Ratio through Low-k / High-k Spacer and Dielectric Gate Stack in 3D FinFET - a Simulation Perspective
 
 
Title: Improvising the Switching Ratio through Low-k / High-k Spacer and Dielectric Gate Stack in 3D FinFET - a Simulation Perspective
Author: Samal, Asharani
Pradhan, Kumar Prasannajit
Mohapatra, Sushanta Kumar
Appeared in: SILICON
Paging: Volume 13 () nr. 8 pages 2655-2660
Year: 2020-08-03
Contents:
Publisher: Springer Netherlands, Dordrecht
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 20 of 35 found articles
 
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