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Journal description
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Details for article 11 of 24 found articles
| Title: |
Enhancement of Performance in TFET by Reducing High-K Dielectric Length and Drain Electrode Thickness |
| Author: |
Rani, C. Sheeja Herobin Bagan, K. Bhoopathy Nirmal, D. Roach, R. Solomon |
| Appeared in: |
SILICON |
| Paging: | Volume 12 () nr. 10 pages 2337-2343 |
| Year: |
2019-12-03 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 11 of 24 found articles
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