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Details for article 1 of 60 found articles
| Title: |
Amorphization of SiO2 Thin Films by Using 200 MeV Ag15+ Ions |
| Author: |
Gaikwad, Anil Mhaisagar, Yogesh Gupta, Swati Joshi, Bhavana Asokan, Kandasami Mahajan, Ashok |
| Appeared in: |
SILICON |
| Paging: | Volume 11 (2018) nr. 2 pages 1017-1021 |
| Year: |
2018 |
| Contents: | |
| Publisher: |
Springer Netherlands, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 1 of 60 found articles
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