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                                       Details for article 41 of 60 found articles
 
 
  Scaling of Dopant Segregation Schottky Barrier Using Metal Strip Buried Oxide MOSFET and its Comparison with Conventional Device
 
 
Title: Scaling of Dopant Segregation Schottky Barrier Using Metal Strip Buried Oxide MOSFET and its Comparison with Conventional Device
Author: Kumar, Prashanth
WasimArif,
Bhowmick, Brinda
Appeared in: SILICON
Paging: Volume 10 (2017) nr. 3 pages 811-820
Year: 2017
Contents:
Publisher: Springer Netherlands, Dordrecht
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 41 of 60 found articles
 
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