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Journal description
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Details for article 12 of 26 found articles
| Title: |
Local/global planarization of polysilicon micropatterns by selectivity controlled CMP |
| Author: |
Shin, Woonki Park, Sungmin Kim, Hyoungjae Joo, Sukbae Jeong, Haedo |
| Appeared in: |
International journal of precision engineering and manufacturing |
| Paging: | Volume 10 (2009) nr. 3 pages 31-36 |
| Year: |
2009 |
| Contents: | |
| Publisher: |
Springer US, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 12 of 26 found articles
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