|
| << previous | next >> |
Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
All articles of the corresponding issues
Details for article 4 of 17 found articles
| Title: |
Effect of in-situ plasma cleaning on the crystalline quality of silicon homoepitaxial films |
| Author: |
Kim, Kwang-sik Kim, Hyoun-woo |
| Appeared in: |
Metals and materials international |
| Paging: | Volume 7 (2001) nr. 6 pages 637-642 |
| Year: |
2001 |
| Contents: | |
| Publisher: |
The Korean Institute of Metals and Materials, Seoul |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 4 of 17 found articles
| << previous | next >> |