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                                       Details for article 17 of 26 found articles
 
 
  Impurity-controlled Mo films as diffusion barriers for Cu metallization
 
 
Title: Impurity-controlled Mo films as diffusion barriers for Cu metallization
Author: Gu, Gil Ho
Park, Sung Min
Park, Chan Gyung
Appeared in: Metals and materials international
Paging: Volume 18 (2012) nr. 3 pages 517-520
Year: 2012
Contents:
Publisher: The Korean Institute of Metals and Materials, Springer
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 17 of 26 found articles
 
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