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Journal description
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Details for article 10 of 20 found articles
| Title: |
Microstructure evolution and resistivity of Cu(B) alloy films on Ti underlayer at the early stage of annealing at 500°C |
| Author: |
Hong, T. K. Lee, S. Han, D. M. Lee, J. G. Lee, J. H. Kim, D. H. Jeong, C. O. Ruh, H. Lee, E. G. Kang, C. H. |
| Appeared in: |
Metals and materials international |
| Paging: | Volume 14 (2008) nr. 5 pages 631-635 |
| Year: |
2008 |
| Contents: | |
| Publisher: |
The Korean Institute of Metals and Materials, Seoul |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 10 of 20 found articles
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