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                                       Details for article 20 of 41 found articles
 
 
  In Situ Electron Diffraction and Resistivity Characterization of Solid State Reaction Process in Cu/Al Bilayer Thin Films
 
 
Title: In Situ Electron Diffraction and Resistivity Characterization of Solid State Reaction Process in Cu/Al Bilayer Thin Films
Author: Moiseenko, Evgeny T.
Altunin, Roman R.
Zharkov, Sergey M.
Appeared in: Metallurgical and materials transactions. A, Physical metallurgy and materials science
Paging: Volume 51 () nr. 3 pages 1428-1436
Year: 2020-01-06
Contents:
Publisher: Springer US, New York
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 20 of 41 found articles
 
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