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                                       Details for article 4 of 23 found articles
 
 
  Effect of the content of hydrogen fluoride in an etchant on the formation of nanopores in silicon during electrolytic etching
 
 
Title: Effect of the content of hydrogen fluoride in an etchant on the formation of nanopores in silicon during electrolytic etching
Author: Abramova, E. N.
Gvelesiani, A. A.
Khort, A. M.
Yakovenko, A. G.
Appeared in: Russian journal of inorganic chemistry
Paging: Volume 59 (2014) nr. 11 pages 1328-1332
Year: 2014
Contents:
Publisher: Pleiades Publishing, Moscow
Source file: Elektronische Wetenschappelijke Tijdschriften
 
 

                             Details for article 4 of 23 found articles
 
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