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Journal description
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Details for article 39 of 45 found articles
| Title: |
Study on Photoresist Transfer in Rotational Near-Field Photolithography Using Molecular Dynamics Simulation |
| Author: |
Ji, Jiaxin He, Sheng Lin, Zhongwen Sun, Shaohua Hu, Yueqiang Meng, Yonggang Wang, Shuangqing |
| Appeared in: |
Plasmonics |
| Paging: | Volume 16 () nr. 5 pages 1799-1807 |
| Year: |
2021-04-10 |
| Contents: | |
| Publisher: |
Springer US, New York |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 39 of 45 found articles
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