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Journal description
All volumes of the corresponding journal
All issues of the corresponding volume
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Details for article 4 of 9 found articles
| Title: |
Charging of submicron structures during silicon dioxide etching in one- and two-frequency gas discharges |
| Author: |
Palov, A. P. Mankelevich, Yu. A. Rakhimova, T. V. Shamiryan, D. |
| Appeared in: |
Plasma physics reports |
| Paging: | Volume 36 (2010) nr. 10 pages 891-901 |
| Year: |
2010 |
| Contents: | |
| Publisher: |
SP MAIK Nauka/Interperiodica, Dordrecht |
| Source file: |
Elektronische Wetenschappelijke Tijdschriften |
Details for article 4 of 9 found articles
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