Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide
Title:
Properties of Al2O3: nc-Si nanostructures formed by implantation of silicon ions into sapphire and amorphous films of aluminum oxide
Author:
Tetelbaum, D. I. Mikhaylov, A. N. Belov, A. I. Ershov, A. V. Pitirimova, E. A. Plankina, S. M. Smirnov, V. N. Kovalev, A. I. Turan, R. Yerci, S. Finstad, T. G. Foss, S.